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Rosemary Ashton

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Edits on 14 Dec, 2021
"Remove inverse infobox"
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Golden AI
edited on 14 Dec, 2021
Edits made to:
Infobox (-24 properties)
Infobox
Patent primary examiner of
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US Patent 7108952 Photopolymerizable composition
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US Patent 7112397 Image forming composition and photosensitive lithographic plate using same
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US Patent 7115690 Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer
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US Patent 7125641 Polymers, resist compositions and patterning process
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US Patent 7125642 Sulfonates, polymers, resist compositions and patterning process
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US Patent 7138217 Positive resist composition
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US Patent 7144675 Radiation-sensitive resin composition
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US Patent 7148265 Functional polymer
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US Patent 7157208 Positive resist composition and pattern forming method using the same
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US Patent 7169532 Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal
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US Patent 7179580 Radiation sensitive material and method for forming pattern
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US Patent 7183037 Antireflective coatings with increased etch rates
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US Patent 7186495 (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
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US Patent 7202015 Positive photoresist composition and pattern making method using the same
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US Patent 7202016 Radiation-sensitive resin composition
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US Patent 7205090 Chemical amplification type positive resist composition
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US Patent 7208261 Polymers, processes for polymer synthesis and photoresist compositions
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US Patent 7226721 Underlayer coating forming composition for lithography containing compound having protected carboxyl group
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US Patent 7244542 Resins and photoresist compositions comprising same
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US Patent 7247419 Nanocomposite photosensitive composition and use thereof
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US Patent 7252925 Nitrogen-containing organic compound, resist composition and patterning process
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US Patent 7258962 Positive-tone radiation-sensitive resin composition
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US Patent 7261997 Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
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US Patent 7267924 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
Edits on 22 Nov, 2021
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edited on 22 Nov, 2021
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Golden AI
edited on 22 Nov, 2021
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Golden AI
edited on 22 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7258962 Positive-tone radiation-sensitive resin composition
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Golden AI
edited on 22 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7252925 Nitrogen-containing organic compound, resist composition and patterning process
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Golden AI
edited on 22 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7247419 Nanocomposite photosensitive composition and use thereof
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Golden AI
edited on 22 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7244542 Resins and photoresist compositions comprising same
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Golden AI
edited on 22 Nov, 2021
Golden AI profile picture
Golden AI
edited on 22 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7208261 Polymers, processes for polymer synthesis and photoresist compositions
Golden AI profile picture
Golden AI
edited on 22 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7205090 Chemical amplification type positive resist composition
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Golden AI
edited on 22 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7202016 Radiation-sensitive resin composition
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Golden AI
edited on 22 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7202015 Positive photoresist composition and pattern making method using the same
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Golden AI
edited on 22 Nov, 2021
Golden AI profile picture
Golden AI
edited on 22 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7183037 Antireflective coatings with increased etch rates
Golden AI profile picture
Golden AI
edited on 22 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7179580 Radiation sensitive material and method for forming pattern
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Golden AI
edited on 22 Nov, 2021
Edits on 20 Nov, 2021
Golden AI profile picture
Golden AI
edited on 20 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7157208 Positive resist composition and pattern forming method using the same
Edits on 19 Nov, 2021
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Golden AI
edited on 19 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7148265 Functional polymer
Golden AI profile picture
Golden AI
edited on 19 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7144675 Radiation-sensitive resin composition
Golden AI profile picture
Golden AI
edited on 19 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7138217 Positive resist composition

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