US Patent 11971657 Photoresist developer and method of developing photoresist
Patent 11971657 was granted and assigned to Taiwan Semiconductor Manufacturing Company on April, 2024 by the United States Patent and Trademark Office.
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US Patent 11971657 Photoresist developer and method of developing photoresist
Article
Patent abstract
A photoresist developer includes a solvent having Hansen solubility parameters of 15<δ
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
An-Ren Zi0
Chin-Hsiang Lin0
Ching-Yu Chang0
Yahru Cheng0
Date of Patent
April 30, 2024
0Patent Application Number
177179840
Date Filed
April 11, 2022
0Patent Citations
Patent Primary Examiner
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