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US Patent 9012132 Coating material and method for photolithography

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
January 2, 2013
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Date of Patent
April 21, 2015
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Patent Application Number
13732944
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Patent Citations Received
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US Patent 12087578 Semiconductor structure and method of forming the same
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US Patent 12025920 Lithography techniques for reducing defects
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US Patent 12062542 Using cumulative heat amount data to qualify hot plate used for postexposure baking
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US Patent 12074025 Photoresist developer and method of developing photoresist
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US Patent 12074058 Patterning methods for semiconductor devices
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US Patent 11664213 Bevel edge removal methods, tools, and systems
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US Patent 11662656 Mask and method of forming the same
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US Patent 11694896 Photoresist developer and method of developing photoresist
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US Patent 11791161 Pattern fidelity enhancement
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US Patent 11841618 Photoresist system and method
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•••
Patent Inventor Names
Ching-Yu Chang
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
9012132
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Patent Primary Examiner
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Brittany Raymond
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