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US Patent 9012132 Coating material and method for photolithography

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US Patent 12087578 Semiconductor structure and method of forming the same
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US Patent 12074058 Patterning methods for semiconductor devices
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US Patent 12074025 Photoresist developer and method of developing photoresist
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US Patent 12062542 Using cumulative heat amount data to qualify hot plate used for postexposure baking
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US Patent 12025920 Lithography techniques for reducing defects
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US Patent 11996432 Image sensor device and manufacturing method thereof
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US Patent 11971657 Photoresist developer and method of developing photoresist
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US Patent 11935746 Pattern formation through mask stress management and resulting structures
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US Patent 11892774 Lithography
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US Patent 11894237 Ultra narrow trench patterning with dry plasma etching
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US Patent 11887851 Method for forming and using mask
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edited on 13 Dec, 2023
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US Patent 11841618 Photoresist system and method
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Patent abstract

Provided is a method including providing a substrate and forming a bottom anti-reflective coating (BARC) on the substrate. The BARC includes a first portion overlying a second portion, which has a different composition than the first portion. The different composition may provide a different dissolution property of the BARC in a developer. A photoresist layer is formed on the first portion of the BARC. The photoresist layer is then irradiated and developed. The developing includes using a developer to remove a region of the photoresist layer and a region of the first and second portions of the BARC.

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US Patent 11791161 Pattern fidelity enhancement
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Ching-Yu Chang0
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=090121320
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edited on 5 Jul, 2023
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US Patent 11694896 Photoresist developer and method of developing photoresist
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Edits on 31 May, 2023
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edited on 31 May, 2023
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US Patent 11662656 Mask and method of forming the same
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edited on 31 May, 2023
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US Patent 11664213 Bevel edge removal methods, tools, and systems
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