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US Patent 11860540 Positive resist composition and patterning process
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Patent
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Date Filed
May 5, 2021
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Date of Patent
January 2, 2024
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Patent Application Number
17308334
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Patent Citations
US Patent 11586110 Positive resist composition and patterning process
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US Patent 11592745 Positive resist composition and patterning process
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US Patent 7482108 Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns
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US Patent 7598016 Resist composition and patterning process
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US Patent 7960091 Resist composition and method of forming resist pattern
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US Patent 9005874 Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern
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US Patent 9122153 Cyclic compound, method for producing same, composition, and method for forming resist pattern
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US Patent 9176379 Resist composition and method for producing resist pattern
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US Patent 9250518 Resist composition and patterning process
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US Patent 9360753 Resist composition and patterning process
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•••
Patent Inventor Names
Jun Hatakeyama
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11860540
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Patent Primary Examiner
John S. Chu
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CPC Code
C08F 226/00
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G03F 7/0392
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C08F 220/382
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C08F 220/04
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G03F 7/0397
0
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