US Patent 11860540 Positive resist composition and patterning process
All edits
Edits on 4 Jan, 2024
Golden AI
Edits made to:
Infobox (+29 properties)
Article (+515 characters)
US Patent 11860540 Positive resist composition and patterning process
Article
Patent abstract
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a sulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and improved CDU, and forms a pattern of good profile after exposure and development.
Infobox
Is a
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jun Hatakeyama0
Date of Patent
January 2, 2024
0Patent Application Number
173083340
Date Filed
May 5, 2021
0Patent Citations
Patent Primary Examiner
Find more entities like US Patent 11860540 Positive resist composition and patterning process
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
