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US Patent 10295904 Resist composition and patterning process

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US Patent 11940728 Molecular resist composition and patterning process
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US Patent 11914291 Resist composition and patterning process
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US Patent 11860540 Positive resist composition and patterning process
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Patent abstract

A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

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US Patent 11774853 Resist composition and patterning process
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Patent Inventor Names
Jun Hatakeyama0
Masaki Ohashi0
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=102959040
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US Patent 11604411 Resist composition and patterning process
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US Patent 11592745 Positive resist composition and patterning process
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US Patent 11586110 Positive resist composition and patterning process
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US Patent 11493843 Resist composition and patterning process
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US Patent 11460772 Positive resist composition and patterning process
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=10295904

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