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US Patent 10295904 Resist composition and patterning process
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Patent
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Date Filed
May 18, 2017
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Date of Patent
May 21, 2019
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Patent Application Number
15598428
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Patent Citations Received
US Patent 11940728 Molecular resist composition and patterning process
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US Patent 11493843 Resist composition and patterning process
US Patent 11269253 Resist composition and patterning process
US Patent 11774853 Resist composition and patterning process
US Patent 11860540 Positive resist composition and patterning process
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US Patent 11914291 Resist composition and patterning process
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US Patent 11460772 Positive resist composition and patterning process
US Patent 11586110 Positive resist composition and patterning process
US Patent 11592745 Positive resist composition and patterning process
US Patent 11604411 Resist composition and patterning process
Patent Inventor Names
Jun Hatakeyama
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Masaki Ohashi
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10295904
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Patent Primary Examiner
Cynthia Hamilton
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