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Sin Lee

based in United Kingdom

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Edits on 20 Aug, 2022
"Infobox creation from: https://mobile.twitter.com/aliceahsinlee"
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Golden AI
edited on 20 Aug, 2022
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Location
Edinburgh
Edinburgh
"Edit from table cell"
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godwinno feliks
edited on 20 Aug, 2022
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Twitter URL
https://mobile.twitter.com/aliceahsinlee
Edits on 14 Dec, 2021
"Remove inverse infobox"
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Golden AI
edited on 14 Dec, 2021
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Patent primary examiner of
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US Patent 7087356 193nm resist with improved post-exposure properties
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US Patent 7090962 Alkali-soluble resin with polyaromatic group and photosensitive composition comprising the resin
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US Patent 7094515 Stimulus sensitive compound and stimulus sensitive composition containing the same
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US Patent 7101653 Laser-engravable flexographic printing elements having relief-forming elastomeric layers comprising syndiotactic 1,2-polybutadiene
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US Patent 7108953 Dissolution inhibitors in photoresist compositions for microlithography
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US Patent 7118846 Positive resist composition and method of forming a resist pattern using the same
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US Patent 7122291 Photoresist compositions
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US Patent 7125640 Resist for photolithography having reactive groups for subsequent modification of the resist structures
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US Patent 7129015 Silicon-containing polymer, negative type resist composition comprising the same, and patterning method for semiconductor device using the same
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US Patent 7129021 Polymer system with switchable physical properties and its use in direct exposure printing plates
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US Patent 7129022 Photo-polymerization type photo-sensitive electrode paste composition for plasma display panel and fabricating method thereof
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US Patent 7132215 Ester compounds, polymers, resist compositions and patterning process
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US Patent 7132216 Non-aromatic chromophores for use in polymer anti-reflective coatings
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US Patent 7132217 Organic anti-reflective coating composition and pattern forming method using the same
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US Patent 7135269 Polymer, resist composition and patterning process
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US Patent 7135270 Resist polymer, resist composition and patterning process
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US Patent 7135271 Photosensitive composition
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US Patent 7144676 Imaging compositions and methods
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US Patent 7147984 Positive-working chemical-amplification photoresist composition
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US Patent 7147985 Resist compounds including acid labile groups having hydrophilic groups attached thereto
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US Patent 7147987 Positive resist composition and pattern formation method using the same
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US Patent 7150961 Additive for photoresist composition for resist flow process
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US Patent 7157204 Soluble polyimide for photosensitive polyimide precursor and photosensitive polyimide precursor composition comprising the soluble polyimide
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US Patent 7157206 Positive resist composition
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US Patent 7160666 Photosensitive resin composition
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US Patent 7160668 Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
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US Patent 7163781 Process for producing a semiconductor device
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US Patent 7166410 Colored photosensitive resin composition and color filter comprising the same
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US Patent 7166412 Photosensitive metal nanoparticle and method of forming conductive pattern using the same
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US Patent 7169530 Polymer compound, resist material and pattern formation method
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US Patent 7172849 Antireflective hardmask and uses thereof
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US Patent 7172850 Preparation of solvent-resistant binder for an imageable element
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US Patent 7175963 Chemical amplification type positive resist composition and a resin therefor
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US Patent 7179582 Radical polymerizable composition and lithographic printing plate precursor using the same
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US Patent 7183038 Lithographic printing plate precursor and lithographic printing method
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US Patent 7186496 Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
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US Patent 7189490 Photoresists containing sulfonamide component
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US Patent 7189493 Polymer, positive resist composition, and patterning process using the same
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US Patent 7192684 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process
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US Patent 7192686 Photoacid generators based on novel superacids
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US Patent 7192688 Polybutadiene (meth)acrylate composition and method
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US Patent 7195857 Resist curable resin composition and cured article thereof
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US Patent 7198887 Organic anti-reflective coating polymer, its preparation method and organic anti-reflective coating composition comprising the same
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US Patent 7198888 Water-soluble material, chemically amplified resist and pattern formation method using the same
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US Patent 7202011 Photosensitive polymer including fluorine and resist composition containing the same
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US Patent 7202014 Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition
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US Patent 7205089 Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same
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US Patent 7208260 Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same
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US Patent 7211369 VLSI-based system for durable high-density information storage
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US Patent 7214469 Lithographic printing plate precursor and lithographic printing method
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US Patent 7217490 Processes for producing silane monomers and polymers and photoresist compositions comprising same
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US Patent 7217495 Fluorinated polymers, photoresists and processes for microlithography
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US Patent 7217496 Fluorinated photoresist materials with improved etch resistant properties
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US Patent 7217498 Heat-sensitive lithographic printing plate precursor
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US Patent 7220533 Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, and method for producing printed wiring board
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US Patent 7223519 Imaging compositions and methods
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US Patent 7223523 Demonstration kit and method for enhancing and/or demonstrating photoactive properties
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US Patent 7226724 Positive-type photosensitive composition
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US Patent 7232639 Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same
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US Patent 7232647 Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board
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US Patent 7232648 Photosensitive resin composition and coating film cured product thereof
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US Patent 7232651 Optical recording materials
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US Patent 7235341 Positive resist composition
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US Patent 7235344 Energy harvesting molecules and photoresist technology
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US Patent 7244545 Fluorinated compound, fluoropolymer and process for its production
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US Patent 7244549 Pattern forming method and bilayer film
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US Patent 7250246 Positive resist composition and pattern formation method using the same
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US Patent 7252923 Methods for producing pattern-forming body
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US Patent 7255971 Positive resist composition
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US Patent 7255973 Positive resist compositions and patterning process
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US Patent 7258964 Printing plates using binder resins having polyethylene oxide segments
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US Patent 7261993 Photoresists and processes for microlithography
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US Patent 7261998 Imageable element with solvent-resistant polymeric binder
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US Patent 7264912 Method of producing photoresist
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US Patent 7267929 Negative photosensitive resin composition
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US Patent 7270931 Silicon-containing compositions for spin-on ARC/hardmask materials
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US Patent 7270932 Imaging composition and method
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US Patent 7276323 Photoresists, polymers and processes for microlithography
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US Patent 7276324 Nitrogen-containing organic compound, resist composition and patterning process
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US Patent 7276327 Silicon-containing compositions for spin-on arc/hardmask materials
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US Patent 7279266 Photosensitive composition and lithographic printing plate precursor using the same
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US Patent 7282321 Lithographic printing method and presensitized plate
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US Patent 7285369 Positive resist composition and pattern formation method using the same
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US Patent 7288359 Radiation-sensitive resin composition
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US Patent 7288362 Immersion topcoat materials with improved performance
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US Patent 7291443 Polymerizable composition and image-recording material using the same
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US Patent 7297460 Radiation curable ink compositions suitable for ink-jet printing
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US Patent 7297465 Heat-sensitive lithographic printing plate precursor
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US Patent 7303855 Photoresist undercoat-forming material and patterning process
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US Patent 7312013 Photoreactive composition
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US Patent 7314701 Radiation-sensitive resin composition
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US Patent 7316884 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process
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US Patent 7320855 Silicon containing TARC/barrier layer
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US Patent 7323288 Layers in printing plates, printing plates and method of use of printing plates
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US Patent 7323292 Process for using photo-definable layers in the manufacture of semiconductor devices and resulting structures of same
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US Patent 7326514 Organoelement resists for EUV lithography and methods of making the same
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US Patent 7326523 Low refractive index polymers as underlayers for silicon-containing photoresists
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US Patent 7332258 Positive resist composition and process for forming pattern using the same
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US Patent 7338748 Polymerizable composition and planographic printing plate precursor
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US Patent 7338751 Process for producing printed wiring board and photosensitive resin composition used in the same
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US Patent 7341821 Method for manufacture of lithographic printing plate precursor no dampening water
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US Patent 7348126 Negative working, heat-sensitive lithographic printing plate precursor
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US Patent 7351515 Positive resist composition and pattern-forming method using the same
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US Patent 7358028 Chemically amplified positive photo resist composition and method for forming resist pattern
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US Patent 7358032 Planographic printing plate precursor
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US Patent 7358036 Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same
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US Patent 7361446 Positive resist composition
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US Patent 7361448 Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same
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US Patent 7361450 Photosensitive resins, resin compositions and products of curing thereof
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US Patent 7364829 Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device
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US Patent 7364834 Functional polymer
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US Patent 7368218 Positive resist compositions and patterning process
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US Patent 7368224 Photopolymerizable composition
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US Patent 7378223 Photoresist resin composition
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US Patent 7390608 Photoresists containing Si-polymers
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US Patent 7390609 Polymers and photoresists comprising same
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US Patent 7416832 Positive resist composition
Edits on 1 Dec, 2021
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Golden AI
edited on 1 Dec, 2021
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Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7416832 Positive resist composition
Edits on 30 Nov, 2021
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Golden AI
edited on 30 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7390609 Polymers and photoresists comprising same
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Golden AI
edited on 30 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7390608 Photoresists containing Si-polymers
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Golden AI
edited on 29 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7378223 Photoresist resin composition
Edits on 26 Nov, 2021
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Golden AI
edited on 26 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7368224 Photopolymerizable composition
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Golden AI
edited on 26 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7368218 Positive resist compositions and patterning process
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Golden AI
edited on 26 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7364834 Functional polymer
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Golden AI
edited on 26 Nov, 2021
Edits on 25 Nov, 2021
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Golden AI
edited on 25 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7361450 Photosensitive resins, resin compositions and products of curing thereof
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Golden AI
edited on 25 Nov, 2021
Golden AI profile picture
Golden AI
edited on 25 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7361446 Positive resist composition
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Golden AI
edited on 25 Nov, 2021
Golden AI profile picture
Golden AI
edited on 25 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7358032 Planographic printing plate precursor
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Golden AI
edited on 25 Nov, 2021
Golden AI profile picture
Golden AI
edited on 24 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7351515 Positive resist composition and pattern-forming method using the same
Edits on 24 Nov, 2021
Golden AI profile picture
Golden AI
edited on 24 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7348126 Negative working, heat-sensitive lithographic printing plate precursor
Edits on 23 Nov, 2021
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Golden AI
edited on 23 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7341821 Method for manufacture of lithographic printing plate precursor no dampening water

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