US Patent 11940728 Molecular resist composition and patterning process
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US Patent 11940728 Molecular resist composition and patterning process
Article
Patent abstract
A molecular resist composition and a pattern forming process. A molecular resist composition comprising a sulfonium salt having a cation of specific structure and an organic solvent has a high sensitivity and forms a resist film with improved resolution and LWR, when processed by EB or EUV lithography. The molecular resist composition does not contain a base polymer. The molecular resist composition comprising a sulfonium salt having a cation of specific partial structure has a high sensitivity and forms a resist film with improved resolution and LWR, so that the resist composition is quite useful for precise micropatterning.
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Patent Jurisdiction
Patent Number
Patent Inventor Names
Kazuhiro Katayama0
Masahiro Fukushima0
Masaki Ohashi0
Shun Kikuchi0
Date of Patent
March 26, 2024
0Patent Application Number
174843330
Date Filed
September 24, 2021
0Patent Citations
Patent Primary Examiner
CPC Code
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