Daborah Chacko-Davis

US Patent 11174350 Resin and photosensitive resin composition

US Patent 11181821 Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer

US Patent 7462442 Biocompatible microchip and a method for producing the same

US Patent 7498106 Method and apparatus for controlling etch processes during fabrication of semiconductor devices

US Patent 7498124 Sacrificial surfactanated pre-wet for defect reduction in a semiconductor photolithography developing process

US Patent 7501226 Immersion lithography system with wafer sealing mechanisms

US Patent 11187981 Resist composition and method of forming resist pattern

US Patent 11187983 EUV patterning of monolayers for selective atomic layer deposition

US Patent 11187985 Method and composition for improving LWR in patterning step using negative tone photoresist

US Patent 7517639 Seal ring arrangements for immersion lithography systems

US Patent 7625694 Selective provision of a diblock copolymer material

US Patent 7632629 Interference colored filters

US Patent 7649184 Processing method and system

US Patent 7655384 Methods for reducing spherical aberration effects in photolithography

US Patent 7662546 Apparatus for processing substrate and method of processing the same

US Patent 7666580 System and method for contrast enhanced zone plate array lithography

US Patent 7667819 System and method for contrast enhanced zone plate array lithography

US Patent 7670759 Micro pattern forming method and semiconductor device manufacturing method

US Patent 7678535 Method for fabricating semiconductor device with recess gate

US Patent 7713684 System and method for absorbance modulation lithography

US Patent 7714988 System and method for absorbance modulation lithography

US Patent 7718347 Method for making an improved thin film solar cell interconnect using etch and deposition process

US Patent 7718350 Method of metal plating by using frame

US Patent 7732121 Near-field exposure method

US Patent 7738078 Optimized mirror design for optical direct write

US Patent 7766640 Contact lithography apparatus, system and method

US Patent 7771892 Double exposure method and photomask for same

US Patent 7776495 Semiconductor device and manufacturing method thereof

US Patent 7781152 Ozone-assisted lithography process with image enhancement for CPP head manufacturing

US Patent 7787706 Method for controlling an intensity of an infrared source used to detect objects adjacent to an interactive display surface

US Patent 7790359 Plating method

US Patent 7795369 Sulfur atom-containing anti-reflective coating forming composition for lithography

US Patent 7799517 Single/double dipole mask for contact holes

US Patent 7803517 Method of forming fine contact hole and method of fabricating semiconductor device using block copolymers

US Patent 7807334 Substrate having fine line, electron source and image display apparatus

US Patent 7807336 Method for manufacturing semiconductor device

US Patent 7807342 Transmission mask with differential attenuation to improve ISO-dense proximity

US Patent 7811745 Method of manufacturing semiconductor device

US Patent 7811746 Method of patterning a positive tone resist layer overlaying a lithographic substrate

US Patent 7811747 Method of patterning an anti-reflective coating by partial developing

US Patent 7816071 Process of imaging a photoresist with multiple antireflective coatings

US Patent 7820363 Process for forming a solder mask, apparatus thereof and process for forming electric-circuit patterned internal dielectric layer

US Patent 7824842 Method of patterning a positive tone resist layer overlaying a lithographic substrate

US Patent 7827682 Apparatus for making circuitized substrates having photo-imageable dielectric layers in a continuous manner

US Patent 7842450 Method of forming a semiconductor device

US Patent 7846649 High resolution printer and a method for high resolution printing

US Patent 7851137 Method of manufacturing semiconductor device

US Patent 7851139 Pattern forming method

US Patent 7855048 Wafer assembly having a contrast enhancing top anti-reflecting coating and method of lithographic processing

US Patent 7858293 Method for double imaging a developable anti-reflective coating

US Patent 7858294 Method to restore hydrophobicity in dielectric films and materials

US Patent 7859642 Apparatus and method for exposing edge of substrate

US Patent 7862985 Method for double patterning a developable anti-reflective coating

US Patent 7867687 Methods and compositions for reducing line wide roughness

US Patent 7867695 Methods for mastering microstructures through a substrate using negative photoresist

US Patent 7867696 Method and apparatus for monitoring saturation levels of solvents used during rapid prototyping processes

US Patent 7868464 Multilayer substrate and manufacturing method thereof

US Patent 7875419 Method for removing resist pattern and method for manufacturing semiconductor device

US Patent 7879531 Immersion lithography fluids

US Patent 7879534 Fabrication of a high resolution biological molecule detection device

US Patent 7879538 Frequency division multiplexing (FDM) lithography

US Patent 7883835 Method for double patterning a thin film

US Patent 7883838 Organometallic composition for forming a metal alloy pattern and a method of forming such a pattern using the composition

US Patent 7883839 Method and apparatus for nano-pantography

US Patent 7886428 Method of producing multilayer printed wiring board and photosensitive dry film used therefor

US Patent 7887999 Method of making a pillar pattern using triple or quadruple exposure

US Patent 7897324 Lithographic method

US Patent 7923198 Method of manufacturing fine T-shaped electrode

US Patent 7924401 Seal ring arrangements for immersion lithography systems

US Patent 7927783 Tunable lithography with a refractive mask

US Patent 7932017 Method of double patterning a thin film using a developable anti-reflective coating and a developable organic planarization layer

US Patent 7932020 Contact or proximity printing using a magnified mask image

US Patent 7943289 Inverse resist coating process

US Patent 7947428 Method for forming photosensitive polyimide pattern and electronic devices having the pattern

US Patent 7947429 Long length flexible circuits and method of making same

US Patent 7968272 Semiconductor device manufacturing method to form resist pattern

US Patent 7977034 Method for making circuitized substrates having photo-imageable dielectric layers in a continuous manner

US Patent 7989142 Photo-masking method for fabricating TFT array substrate

US Patent 7989151 Resolution enhancement in optical lithography via absorbance-modulation enabled multiple exposures

US Patent 7989152 Magneto-optical photoresist

US Patent 7989155 Lithographic method

US Patent 7993814 Method for forming patterns using single mask

US Patent 7993815 Line ends forming

US Patent 7998663 Pattern formation method

US Patent 8003300 Methods for fabricating complex micro and nanoscale structures and electronic devices and components made by the same

US Patent 8007986 Immersion lithography fluids

US Patent 8012670 Photoresist systems

US Patent 8012673 Processing a copolymer to form a polymer memory cell