Peter B. Kim

US Patent 7088428 Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method

US Patent 7092072 Calibration apparatus and method of calibrating a radiation sensor in a lithographic apparatus

US Patent 7092074 Paper feeding apparatus and image forming apparatus including the same

US Patent 7095483 Process independent alignment marks

US Patent 7098992 Light source unit and wavelength stabilizing control method, exposure apparatus and exposure method, method of making exposure apparatus, and device manufacturing method and device

US Patent 7098993 Exposure device for exposing a photosensitive material in accordance with image data

US Patent 7098994 Lithographic apparatus, device manufacturing method, and device manufactured thereby

US Patent 7106414 Exposure system and method for manufacturing device

US Patent 7110081 Lithographic apparatus and device manufacturing method

US Patent 7110087 Lithographic apparatus and device manufacturing method

US Patent 7113257 Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus

US Patent 7113258 Lithographic apparatus

US Patent 7116401 Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method

US Patent 7123342 Image forming apparatus including a controller for controlling an exposure of a photosensitive member for minimizing the difference in tone between areas on the photosensitive member

US Patent 7123347 Image formation characteristics adjustment method for projection optical system

US Patent 7123349 Lithographic projection assembly, substrate handling apparatus and substrate handling method

US Patent 7126671 Lithographic apparatus and device manufacturing method

US Patent 7136142 Lithographic apparatus having a gas flushing device

US Patent 7136150 Imprint lithography template having opaque alignment marks

US Patent 7136151 Reticle gripper barrier system for lithography use

US Patent 7139064 Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same

US Patent 7139066 Reticle carrier including reticle positioning and location means

US Patent 7142287 Lithographic apparatus, device manufacturing method, and device manufactured thereby

US Patent 7145630 Lithographic apparatus and device manufacturing method

US Patent 7145637 Illumination system having a more efficient collector optic

US Patent 7145641 Lithographic apparatus, device manufacturing method, and device manufactured thereby

US Patent 7154581 Scanning exposure apparatus, manufacturing method thereof, and device manufacturing method

US Patent 7154586 Catoptric projection optical system and exposure apparatus having the same

US Patent 7158210 Projection exposure apparatus

US Patent 7158212 Scanning exposure apparatus and device manufacturing method

US Patent 7170580 Lithographic apparatus, projection system, method of projecting and device manufacturing method

US Patent 7170589 Apparatus to vary dimensions of a substrate during nano-scale manufacturing

US Patent 7187429 Alignment method, exposure apparatus and device fabrication method

US Patent 7190437 Wireless signaling in a lithographic apparatus

US Patent 7193684 Projection exposure mask, projection exposure apparatus, and projection exposure method

US Patent 7193687 Positioning apparatus and method for manufacturing same

US Patent 7196770 Prewetting of substrate before immersion exposure

US Patent 7196775 Patterned mask holding device and method using two holding systems

US Patent 7199858 Lithographic apparatus and device manufacturing method

US Patent 7202934 Lithographic apparatus and device manufacturing method

US Patent 7202936 Stage unit, drive table, and scanning exposure apparatus using same

US Patent 7202938 Off-axis levelling in lithographic projection apparatus

US Patent 7206058 Off-axis levelling in lithographic projection apparatus

US Patent 7209219 System for controlling a position of a mass

US Patent 7209220 System for using a two part cover for and a box for protecting a reticle

US Patent 7215407 Transport method and transport apparatus for semiconductor wafer

US Patent 7224436 Lithographic apparatus and device manufacturing method

US Patent 7224443 Imprint lithography substrate processing tool for modulating shapes of substrates

US Patent 7227612 Lithographic apparatus and device manufacturing method

US Patent 7227616 Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus

US Patent 7230674 Lithographic apparatus and device manufacturing method

US Patent 7230680 Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method

US Patent 7242456 System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions

US Patent 7245348 Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning

US Patent 7245358 Substrate support system

US Patent 7248332 Lithographic apparatus and device manufacturing method

US Patent 7248337 Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby

US Patent 7250094 Heat treatment apparatus

US Patent 7259826 Image recording apparatus recording lid open/close history

US Patent 7259833 Substrate support method

US Patent 7265814 Mirror holding method and optical apparatus

US Patent 7271876 Projection objective for microlithography

US Patent 7274435 Exposure apparatus and device fabrication method using the same

US Patent 7277156 Scanner apparatus with twin substrate stage, semiconductor photo equipment with the apparatus and method of manufacturing a semiconductor device using the equipment

US Patent 7277159 System and method for automatically mounting a pellicle assembly on a photomask

US Patent 7277160 Method for automatically providing data for the focus monitoring of a lithographic process

US Patent 7280183 Image forming device

US Patent 7283202 In-situ interferometer arrangement

US Patent 7286208 In-situ interferometer arrangement

US Patent 7289191 Illumination optical system, and image display apparatus and image exposure apparatus using the same

US Patent 7289194 Positioning apparatus, exposure apparatus, and device manufacturing method

US Patent 7289727 Image processor with integrated printing

US Patent 7292309 Exposure apparatus and device manufacturing method

US Patent 7292310 Lithographic apparatus and a device manufacturing method

US Patent 7292311 Scanning exposure technique

US Patent 7292313 Apparatus and method for providing fluid for immersion lithography

US Patent 7292315 Optimized polarization illumination

US Patent 7298456 System for varying dimensions of a substrate during nanoscale manufacturing

US Patent 7301603 Exposure system and method

US Patent 7304715 Lithographic apparatus and device manufacturing method

US Patent 7304717 Imaging device in a projection exposure facility

US Patent 7304720 System for using a two part cover for protecting a reticle

US Patent 7307692 Exposure apparatus and device manufacturing method

US Patent 7307698 Exposure apparatus and device manufacturing method

US Patent 7312845 Method of capturing and processing sensed images

US Patent 7317507 Lithographic apparatus and device manufacturing method

US Patent 7317508 Optical system and method for the production of micro-structured components by microlithography

US Patent 7321605 Helical optical pulse stretcher

US Patent RE40043 Positioning device having two object holders

US Patent 7333177 Lithographic apparatus and device manufacturing method

US Patent 7333180 Positioning apparatus and exposure apparatus using the same

US Patent 7339652 Apparatus for projecting a pattern into an image plane

US Patent 7342645 Stage control apparatus and method, stage apparatus and exposure apparatus

US Patent 7345735 Apparatus for aberration detection and measurement

US Patent 7349064 Immersion exposure technique

US Patent 7349065 Exposure apparatus and device fabrication method

US Patent 7349066 Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence

US Patent 7352433 Lithographic apparatus and device manufacturing method

US Patent 7352437 Exposure apparatus

US Patent 7355680 Method for adjusting lithographic mask flatness using thermally induced pellicle stress

US Patent 7359030 Lithographic apparatus and device manufacturing method

US Patent 7359037 Drive for reticle-masking blade stage

US Patent 7362413 Uniformity correction for lithographic apparatus

US Patent 7362416 Exposure apparatus, evaluation method and device fabrication method

US Patent 7362418 Duplicate apparatus

US Patent 11181826 Projection exposure method and projection exposure apparatus for microlithography

US Patent 7365829 Method and apparatus for image formation

US Patent 7365830 Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method

US Patent 7372537 Print processing apparatus capable of calibration printing

US Patent 7372546 Optical axis adjustment device and exposure apparatus using the same

US Patent 7372548 Levitated reticle-masking blade stage

US Patent 7375800 Non-contact pneumatic transfer for stages with small motion

US Patent 7379152 Exposure apparatus and exposure method

US Patent 7379157 Exposure apparatus and method for manufacturing device

US Patent 7382438 Lithographic apparatus and device manufacturing method

US Patent 7388652 Wave front sensor with grey filter and lithographic apparatus comprising same

US Patent 7391498 Technique of suppressing influence of contamination of exposure atmosphere

US Patent 7391499 Lithographic apparatus and device manufacturing method

US Patent 7391502 Lithographic apparatus, device manufacturing method, and method of manufacturing a component

US Patent 7394525 Exchangeable object handling apparatus, lithographic apparatus including such exchangeable object handling apparatus, and device manufacturing method

US Patent 7397535 Lithographic apparatus and device manufacturing method

US Patent 7397538 Radiation system and lithographic apparatus

US Patent 7397539 Transfer apparatus for transferring an object, lithographic apparatus employing such a transfer apparatus, and method of use thereof

US Patent 7403261 Lithographic apparatus and device manufacturing method

US Patent 7408621 Projection exposure system

US Patent 7408622 Illumination system and polarizer for a microlithographic projection exposure apparatus

US Patent 7411656 Optically polarizing retardation arrangement, and a microlithography projection exposure machine

US Patent 7411658 Lithographic apparatus and device manufacturing method

US Patent 7414701 Method and systems for total focus deviation adjustments on maskless lithography systems

US Patent 7417710 Lithographic apparatus and device manufacturing method

US Patent 7417714 Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage

US Patent 7420651 Immersion exposure technique

US Patent 7420654 Method of varying dimensions of a substrate during nano-scale manufacturing

US Patent 7420655 Reticle-carrying container

US Patent 7423724 Exposure apparatus and device manufacturing method

US Patent 7423729 Method of monitoring the light integrator of a photolithography system

US Patent 7426014 Dynamic fluid control system for immersion lithography

US Patent 7426017 Focus test mask, focus measurement method and exposure apparatus

US Patent 7426018 Lithographic apparatus, illumination system and filter system

US Patent 7428039 Method and apparatus for providing uniform illumination of a mask in laser projection systems

US Patent 7430036 Maskless exposure apparatus using optical modulator, and method for monitoring pattern generating performance by the optical modulator

US Patent 7436490 Exposure apparatus using blaze type diffraction grating to diffract EUV light and device manufacturing method using the exposure apparatus

US Patent 7443483 Systems and methods for fluid flow control in an immersion lithography system

US Patent 7450218 Semiconductor manufacturing scanner having reticle masking device, and exposure method using the same

US Patent 7456933 Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus

US Patent 7460208 Lithographic apparatus and device manufacturing method

US Patent 7463333 Multi-exposure lithography system providing increased overlay accuracy

US Patent 7463336 Device manufacturing method and apparatus with applied electric field

US Patent 7466392 Exposure apparatus, exposure method, and method for producing device

US Patent 7466393 Immersion exposure technique

US Patent 7466396 Lithography apparatus and method utilizing pendulum interferometer system

US Patent 7468784 Method and device for forming optical or magnetic memory media or a template for the same

US Patent 7471372 Exposure apparatus and production method of device using the same

US Patent 7474378 Assembly, a lithographic apparatus, and a device manufacturing method

US Patent 7474382 Method for determining focus deviation amount in pattern exposure and pattern exposure method

US Patent 7474383 Mask making method, mask making device, and mask drawing device

US Patent 7474385 Adjustable resolution interferometric lithography system

US Patent 7474386 Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method

US Patent 7477358 EUV reticle handling system and method

US Patent 7483121 Microlithograph system

US Patent 7489385 Lithographic projection apparatus with collector including concave and convex mirrors

US Patent 7489388 Lithographic apparatus and device manufacturing method

US Patent 7492442 Adjustable resolution interferometric lithography system

US Patent 7495742 Measuring method and apparatus, exposure method and apparatus using the same, and device manufacturing method

US Patent 7499148 Polarizer, projection lens system, exposure apparatus and exposing method

US Patent 7505113 Lithographic apparatus and device manufacturing method

US Patent 7505115 Exposure apparatus, method for producing device, and method for controlling exposure apparatus

US Patent 7505116 Lithographic apparatus and device manufacturing method

US Patent 7508487 Lithographic apparatus, device manufacturing method, and device manufactured thereby

US Patent 7508491 Lithographic apparatus and device manufacturing method utilized to reduce quantization influence of datapath SLM interface to dose uniformity

US Patent 7508492 Surface light source control apparatus and surface light source control method

US Patent 7508494 Lithographic apparatus and a subtrate table for exciting a shockwave in a substrate

US Patent 7515246 Exposure apparatus, exposure method, and method for producing device

US Patent 7515250 In-situ interferometer arrangement

US Patent 11187988 Exposure apparatus, and article manufacturing method

US Patent 7522262 Method for determining position of reference point

US Patent 7522263 Lithographic apparatus and method

US Patent 7522265 Optical aligner using a compensation light

US Patent 7522267 Substrate transport apparatus with automated alignment

US Patent 7525637 Assembly

US Patent 7525639 Exposure apparatus and method, and device manufacturing method using the same

US Patent 7525643 Lithographic apparatus, and mechanism

US Patent 7528930 Exposure apparatus and device manufacturing method

US Patent 7528934 Lithographic apparatus and device manufacturing method

US Patent 7532304 Lithographic apparatus and device manufacturing method

US Patent 7532310 Apparatus, method for supporting and/or thermally conditioning a substrate, a support table, and a chuck

US Patent 7535552 Moving/guiding apparatus and exposure apparatus using the same

US Patent 7538854 Measuring apparatus and exposure apparatus having the same

US Patent 7538855 Lithographic apparatus and device manufacturing method

US Patent 7538858 Photolithographic systems and methods for producing sub-diffraction-limited features

US Patent 7545480 Reticle, exposure apparatus, and methods for measuring the alignment state thereof

US Patent 7548303 Cooling assembly for a stage

US Patent RE40774 Positioning device with a vibration-free object table, and lithographic device provided with such a positioning device

US Patent 7551261 Illumination system for a microlithography projection exposure installation

US Patent 7557901 Lithographic apparatus and device manufacturing method

US Patent 7557902 Projection objective

US Patent 7561248 Immersion exposure technique

US Patent 7561251 Lithographic apparatus and device manufacturing method

US Patent 7561252 Interferometric lithography system and method used to generate equal path lengths of interfering beams

US Patent 7567338 Lithographic apparatus and device manufacturing method

US Patent 7576831 Method and apparatus for maintaining a machine part

US Patent 7580111 Liquid for immersion exposure and immersion exposure method

US Patent 7580113 Method of reducing a wave front aberration, and computer program product

US Patent 7580114 Exposure apparatus and method for manufacturing device

US Patent 7583359 Reduction of fit error due to non-uniform sample distribution

US Patent 7583360 Method for photolithography using multiple illuminations and a single fine feature mask

US Patent 7589818 Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus

US Patent 7593091 Imaging or exposure device, in particular for making an electronic microcircuit

US Patent 7593092 Lithographic apparatus and device manufacturing method

US Patent 7593093 Lithographic apparatus and device manufacturing method

US Patent 7593094 Patterning device

US Patent 7595862 Exposure apparatus and method of manufacturing device

US Patent 7599042 Coating and developing apparatus, substrate processing method and computer-readable recording medium

US Patent 7605906 Patterning systems using photomasks including shadowing elements therein

US Patent 7605907 Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration method

US Patent 7609363 Helical optical pulse stretcher

US Patent 7612867 Lithographic apparatus

US Patent 7619714 Immersion exposure technique

US Patent 7623218 Method of manufacturing a miniaturized device

US Patent 7623219 Exposure apparatus, exposure method, device manufacturing method

US Patent 7626680 Exposure apparatus and device fabrication method using the same

US Patent 7626682 Reticle stages for lithography systems and lithography methods

US Patent 7633600 Lithographic apparatus and device manufacturing method

US Patent 7643127 Prewetting of substrate before immersion exposure

US Patent 7643130 Position measuring apparatus and positional deviation measuring method

US Patent 7646472 Off-axis illumination apparatus, exposure apparatus and off-axis illumination method

US Patent 7649612 Phase shifting photolithography system

US Patent 7649614 Method of characterization, method of characterizing a process operation, and device manufacturing method

US Patent 7652750 Lithography exposure device having a plurality of radiation sources

US Patent 7656501 Lithographic apparatus

US Patent 7663732 Exposure apparatus, exposure method and device manufacturing method for compensating position measuring system using temperature

US Patent 7663735 Microlithographic projection exposure apparatus with immersion projection lens

US Patent 7671968 Lithographic apparatus having masking parts and device manufacturing method

US Patent 7671969 Semiconductor wafer flatness correction apparatus and method

US Patent 7671970 Stage apparatus with two patterning devices, lithographic apparatus and device manufacturing method skipping an exposure field pitch

US Patent 7675604 Hood for immersion lithography

US Patent 7675605 Device and method for transmission image sensing

US Patent 7675606 Lithographic apparatus and method

US Patent 7679718 Immersion exposure technique

US Patent 7684013 Lithographic apparatus and device manufacturing method

US Patent 7688422 Projection optical system, exposure system, and exposure method

US Patent 7692760 Liquid immersion exposure apparatus, method of controlling the same, and device manufacturing method

US Patent 7692765 Lithographic apparatus and method of removing liquid

US Patent 7692767 Projection optical system and exposure apparatus with the same

US Patent 7692771 Imprint lithography

US Patent 7697110 Exposure apparatus and device manufacturing method

US Patent 7697114 Method and apparatus for compensated illumination for advanced lithography

US Patent 7697115 Resonant scanning mirror

US Patent 7701554 Lithographic apparatus, device manufacturing method, and optical component

US Patent 7705964 Exposure system and exposure method

US Patent 7705965 Backside lithography and backside immersion lithography

US Patent 7705966 Immersion exposure apparatus

US Patent 7710542 Imaging device in a projection exposure machine

US Patent 7710543 Scanning exposure apparatus and device manufacturing method

US Patent 7710544 Optimized polarization illumination

US Patent 7714983 Illumination system for a microlithography projection exposure installation

US Patent 7714984 Residual pupil asymmetry compensator for a lithography scanner

US Patent 7714985 Projection optical system

US Patent 7714986 Laser beam conditioning system comprising multiple optical paths allowing for dose control

US Patent 7717966 Barrier assembly for an exposure apparatus

US Patent 7724348 Exposure apparatus and method, and device manufacturing method

US Patent 7724351 Lithographic apparatus, device manufacturing method and exchangeable optical element

US Patent 7728313 Maskless lithography system and method using optical signals

US Patent 7728951 Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus

US Patent 7733459 Lithographic apparatus and device manufacturing method

US Patent 7738075 Lithographic attribute enhancement

US Patent 7738081 Lithographic apparatus and device manufacturing method utilizing a flat panel display handler with conveyor device and substrate handler

US Patent 7742147 Exposure apparatus

US Patent 7746445 Lithographic apparatus, device manufacturing method and a substrate

US Patent 7746446 Alignment condition determination method and apparatus of the same, and exposure method and apparatus of the same

US Patent 7747154 Method of capturing and processing sensed images

US Patent 7751032 Lithographic apparatus and device manufacturing method

US Patent 7755741 Substrate exposure apparatus and illumination apparatus

US Patent 7760326 Exposure apparatus and aberration correction method

US Patent 7764355 Substrate stage and heat treatment apparatus

US Patent 7768627 Illumination of a patterning device based on interference for use in a maskless lithography system

US Patent 7768628 Contact lithography apparatus and method

US Patent 7773195 System and method to increase surface tension and contact angle in immersion lithography

US Patent 7777862 Optical system for increasing illumination efficiency of a patterning device

US Patent 7782440 Projection lens system of a microlithographic projection exposure installation

US Patent 7782443 Illumination system of a microlithographic projection exposure apparatus

US Patent 7782446 Stage system and lithographic apparatus comprising such stage system

US Patent 7791709 Substrate support and lithographic process

US Patent RE41681 Enhanced illuminator for use in photolithographic systems

US Patent 7800732 Projection exposure method and projection exposure apparatus for microlithography

US Patent 7800733 Methods and systems for improved optical lithographic processing

US Patent 7800734 Lighting apparatus, exposure apparatus and microdevice manufacturing method

US Patent 7800735 Z-stage with dynamically driven stage mirror and chuck assembly

US Patent 7804574 Lithographic apparatus and device manufacturing method using acidic liquid

US Patent 7804575 Lithographic apparatus and device manufacturing method having liquid evaporation control

US Patent 7804576 Maintenance method, maintenance device, exposure apparatus, and device manufacturing method

US Patent 7804583 EUV reticle handling system and method

US Patent 7808610 Image sensing and printing device

US Patent 7808611 Lithographic apparatus and device manufacturing method using acidic liquid

US Patent 7808615 Projection exposure apparatus and method for operating the same

US Patent 7808616 Reticle transport apparatus, exposure apparatus, reticle transport method, and reticle processing method

US Patent 7812927 Scanning exposure technique

US Patent 7812930 Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume

US Patent 7817242 Exposure method and device manufacturing method, exposure apparatus, and program

US Patent 7817247 Lithographic apparatus, excimer laser and device manufacturing method

US Patent 7817248 Optical imaging arrangement

US Patent 7817249 Exposure method and apparatus, and device producing method using two light beams to correct non-rotationally symmetric aberration

US Patent 7826030 Lithographic apparatus and device manufacturing method

US Patent 7826038 Method for adjusting lithographic mask flatness using thermally induced pellicle stress

US Patent 7830493 System and method for compensating for radiation induced thermal distortions in a substrate or projection system

US Patent 7830497 System and method for using a two part cover and a box for protecting a reticle

US Patent 7830498 Hydraulic-facilitated contact lithography apparatus, system and method

US Patent 7834974 Lithographic apparatus and device manufacturing method

US Patent 7839482 Assembly comprising a radiation source, a reflector and a contaminant barrier

US Patent 7839487 Optical system for increasing illumination efficiency of a patterning device

US Patent 7839488 Optical axis adjustment device and exposure apparatus using the same

US Patent 7843548 Conduit system for a lithographic apparatus, lithographic apparatus, pump, and method for substantially reducing vibrations in a conduit system

US Patent 7847919 Lithographic apparatus having feedthrough control system

US Patent 7847920 Illumination system and polarizer for a microlithographic projection exposure apparatus

US Patent 7855776 Methods of compensating lens heating, lithographic projection system and photo mask

US Patent 7855777 Exposure apparatus and method for manufacturing device

US Patent 7859646 Interferometric method for improving the resolution of a lithographic system

US Patent 7864293 Exposure apparatus, exposure method, and producing method of microdevice

US Patent 7864298 Stage apparatus and exposure apparatus with heating-and-cooling unit to change shape of mirror

US Patent 7864299 Apparatus for supporting a wafer, apparatus for exposing a wafer and method of supporting a wafer

US Patent 7864301 Source and mask optimization by changing intensity and shape of the illumination source

US Patent 7869000 Stage assembly with lightweight fine stage and low transmissibility

US Patent 7869001 Eddy current damper, and lithographic apparatus having an eddy current damper

US Patent 7876418 Optical element and projection exposure apparatus based on use of the optical element

US Patent 7876420 System and method utilizing an electrooptic modulator

US Patent 7880861 Synchronizing timing of multiple physically or logically separated system nodes

US Patent 7880864 Stage apparatus, exposure apparatus, and device manufacturing method

US Patent 7889312 Apparatus comprising a rotating contaminant trap

US Patent 7889321 Illumination system for illuminating a patterning device and method for manufacturing an illumination system

US Patent 7898644 Lithographic apparatus and device manufacturing method

US Patent 7907250 Immersion lithography method

US Patent 7907251 Exposure apparatus and device manufacturing method

US Patent 7907255 Lithographic apparatus and device manufacturing method

US Patent 7911584 Illumination system for microlithography

US Patent 7911588 Exposure apparatus and original

US Patent 7924397 Anti-corrosion layer on objective lens for liquid immersion lithography applications

US Patent 7924402 Exposure apparatus and device manufacturing method

US Patent 7924406 Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels

US Patent 7924408 Temperature effects on overlay accuracy

US Patent 7929115 Projection objective and projection exposure apparatus for microlithography

US Patent 7929117 Apparatus for real-time contamination, environmental, or physical monitoring of a photomask

US Patent 7932999 Lithographic apparatus and device manufacturing method

US Patent 7936442 Exposure apparatus, exposure method, and device fabrication method

US Patent 7940374 Parallel process focus compensation

US Patent 7940375 Transmission filter apparatus

US Patent 7952684 Light-modulating nano/micro scale aperture array device having immersion layer and high speed nano scale pattern recording system using the same

US Patent 7952685 Illuminator for a lithographic apparatus and method

US Patent 7952686 Stage apparatus, exposure apparatus, and device manufacturing method

US Patent 7956983 Exposure equipment having auxiliary photo mask and exposure method using the same

US Patent 7961289 Immersion exposure apparatus and device manufacturing method with no liquid recovery during exposure

US Patent 7961292 Sub-resolution assist devices and methods

US Patent 7961294 Imaging device in a projection exposure facility

US Patent 7961297 Method for determining intensity distribution in the image plane of a projection exposure arrangement

US Patent 7965375 Lithography mask, rewritable mask, process for manufacturing a mask, device for processing a substrate, lithographic system and a semiconductor device

US Patent 7969556 Illumination optical system for microlithography and illumination system and projection exposure system with an illumination optical system of this type

US Patent 7973907 Method for treating substrate, method for conveying substrate, and apparatus for conveying substrate

US Patent 7982849 Exposure apparatus

US Patent 7982857 Stage apparatus, exposure apparatus, and exposure method with recovery device having lyophilic portion

US Patent 7990516 Immersion exposure apparatus and device manufacturing method with liquid detection apparatus

US Patent 7990517 Immersion exposure apparatus and device manufacturing method with residual liquid detector

US Patent 7999916 Microlithographic projection exposure apparatus

US Patent 8004649 Immersion photolithography system and method using microchannel nozzles

US Patent 8004654 Lithographic apparatus and device manufacturing method

US Patent 8004656 Illumination system for a microlithographic projection exposure apparatus

US Patent 8004658 Lighting optical device, exposure system, and exposure method