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S. Rosasco

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Edits on 14 Dec, 2021
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Golden AI
edited on 14 Dec, 2021
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Infobox (-158 properties)
Infobox
Patent primary examiner of
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US Patent 7087350 Method for combining via patterns into a single mask
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US Patent 7090947 Phase shifter film and process for the same
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US Patent 7090949 Method of manufacturing a photo mask and method of manufacturing a semiconductor device
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US Patent 7094504 Mask, manufacturing method for mask, and manufacturing method for semiconductor device
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US Patent 7094505 Photomask assembly and method for protecting the same from contaminants generated during a lithography process
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US Patent 7097947 Method for correcting local loading effects in the etching of photomasks
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US Patent 7097948 Method for repair of photomasks
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US Patent 7097949 Phase edge phase shift mask enforcing a width of a field gate image and fabrication method thereof
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US Patent 7100322 Method of manufacturing an alternating phase shift mask
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US Patent 7101645 Reflective mask for short wavelength lithography
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US Patent 7105255 EUV reflection mask and lithographic process using the same
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US Patent 7107573 Method for setting mask pattern and illumination condition
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US Patent 7108945 Photomask having a focus monitor pattern
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US Patent 7112390 Method of manufacturing chromeless phase shift mask
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US Patent 7115341 Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same
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US Patent 7115342 Preparation of photomasks
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US Patent 7115344 Photomask and pattern forming method employing the same
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US Patent 7115354 Microfabrication of pattern imprinting
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US Patent 7118832 Reflective mask with high inspection contrast
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US Patent 7118834 Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method
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US Patent 7118835 Semiconductor device and method of forming the same as well as a photo-mask used therein
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US Patent RE39349 Masks for use in optical lithography below 180 nm
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US Patent 7129010 Substrates for in particular microlithography
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US Patent 7132201 Transparent amorphous carbon structure in semiconductor devices
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US Patent 7132202 Mask for laser irradiation, method of manufacturing the same, and apparatus for laser crystallization using the same
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US Patent 7132204 Laser beam pattern mask and crystallization method using the same
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US Patent 7135255 Layout impact reduction with angled phase shapes
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US Patent 7135257 Multi-step phase shift mask and methods for fabrication thereof
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US Patent 7138212 Method and apparatus for performing model-based layout conversion for use with dipole illumination
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US Patent 7141337 Phase shift mask
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US Patent 7141338 Sub-resolution sized assist features
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US Patent 7141339 Process for manufacturing half-tone phase shifting mask blanks
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US Patent 7144178 Mask, method of producing mask, and method of producing semiconductor device
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US Patent 7144682 Near-field exposure method
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US Patent 7144685 Method for making a pattern using near-field light exposure through a photomask
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US Patent 7147974 Methods for converting reticle configurations
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US Patent 7147975 Photomask
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US Patent 7150945 Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light
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US Patent 7150946 Method for the repair of defects in photolithographic masks for patterning semiconductor wafers
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US Patent 7153612 Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby
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US Patent 7153613 Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with a Bragg grating, and dispersion compensating device using the optical fiber
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US Patent 7153615 Extreme ultraviolet pellicle using a thin film and supportive mesh
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US Patent 7157190 Method for repairing a photolithographic mask, and a photolithographic mask
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US Patent 7157191 Single trench repair method with etched quartz for attenuated phase shifting mask
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US Patent 7160651 Manufacturable chromeless alternating phase shift mask structure with phase grating
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US Patent 7160652 Hologram element
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US Patent 7160671 Method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivity
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US Patent 7166392 Halftone type phase shift mask blank and halftone type phase shift mask
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US Patent 7166393 Reflection mask for projecting a structure onto a semiconductor wafer and method for producing the mask
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US Patent 7169513 Halftone type phase shift mask blank and phase shift mask thereof
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US Patent 7169514 Extreme ultraviolet mask with molybdenum phase shifter
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US Patent 7172838 Chromeless phase mask layout generation
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US Patent 7172839 Photomask correction method using composite charged particle beam, and device used in the correction method
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US Patent 7172840 Photomask features with interior nonprinting window using alternating phase shifting
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US Patent 7172841 Crystallization apparatus, crystallization method, and phase shift mask
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US Patent 7175941 Phase shift assignments for alternate PSM
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US Patent 7175942 Method of conflict avoidance in fabrication of gate-shrink alternating phase shifting masks
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US Patent 7175943 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
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US Patent 7179567 Phase shift mask blank, phase shift mask, and method of manufacture
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US Patent 7179570 Chromeless phase shift lithography (CPL) masks having features to pattern large area line/space geometries
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US Patent 7186480 Method for adjusting dimensions of photomask features
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US Patent 7189480 Mask used for layer formation and process of making the mask
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US Patent 7189495 Method of forming photoresist pattern free from side-lobe phenomenon
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US Patent 7195845 Spin-coating method, determination method for spin-coating condition and mask blank
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US Patent 7195846 Methods of manufacturing photomask blank and photomask
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US Patent 7198872 Light scattering EUVL mask
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US Patent 7205075 Method of forming a vertical memory device with a rectangular trench
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US Patent 7205076 Mask for laser irradiation and apparatus for laser crystallization using the same
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US Patent 7205077 Method for producing photomask and method for producing photomask pattern layout
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US Patent 7211354 Mask substrate and its manufacturing method
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US Patent 7211355 Method for producing phase shifter masks
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US Patent 7214453 Mask and its manufacturing method, exposure, and device fabrication method
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US Patent 7223504 Crystallization mask, crystallization method, and method of manufacturing thin film transistor including crystallized semiconductor
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US Patent 7226707 Methods of printing structures
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US Patent 7226708 Multi-layer, attenuated phase-shifting mask
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US Patent 7229721 Method for evaluating photo mask and method for manufacturing semiconductor device
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US Patent 7229722 Alternating phase shift mask design for high performance circuitry
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US Patent 7229723 Method for forming an opening in a light-absorbing layer on a mask
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US Patent 7229724 Reticles and methods of forming and using the same
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US Patent 7232629 Method of forming and testing a phase shift mask
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US Patent 7232630 Method for printability enhancement of complementary masks
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US Patent 7241538 Method for providing representative features for use in inspection of photolithography mask and for use in inspection photo-lithographically developed and/or patterned wafer layers, and products of same
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US Patent 7241539 Photomasks including shadowing elements therein and related methods and systems
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US Patent 7244334 Apparatus used in reshaping a surface of a photoresist
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US Patent 7247410 Complementary division mask, method of producing mask, and program
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US Patent 7252909 Method to reduce CD non-uniformity in IC manufacturing
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US Patent 7252910 Fabrication method of semiconductor integrated circuit device and mask fabrication method
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US Patent 7252911 ESD-resistant photomask and method of preventing mask ESD damage
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US Patent 7261980 X-ray mask blank and x-ray mask
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US Patent 7261981 System and method of smoothing mask shapes for improved placement of sub-resolution assist features
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US Patent 7261982 Planar circuit optimization
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US Patent 7264415 Methods of forming alternating phase shift masks having improved phase-shift tolerance
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US Patent 7264905 Photomask, and method and apparatus for producing the same
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US Patent 7264906 OPC based illumination optimization with mask error constraints
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US Patent 7264907 Photomask having central and peripheral line patterns
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US Patent 7264908 Photo mask blank and photo mask
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US Patent 7267912 Exposure mask and pattern exposure method
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US Patent 7276317 Laser mask and method of crystallization using the same
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US Patent 7279252 Substrate for the micro-lithography and process of manufacturing thereof
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US Patent 7282305 Reflective mask blank having a programmed defect and method of producing the same, reflective mask having a programmed defect and method of producing the same, and substrate for use in producing the reflective mask blank or the reflective mask having a programmed defect
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US Patent 7282306 Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret
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US Patent 7282307 Reflective mask useful for transferring a pattern using extreme ultra violet (EUV) radiation and method of making the same
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US Patent 7282308 Phase shifter film and process for the same
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US Patent 7288344 Accommodating diffraction in the printing of features on a substrate
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US Patent 7291425 Radiation patterning tools, and methods of forming radiation patterning tools
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US Patent 7294437 Quick and accurate modeling of transmitted field
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US Patent 7294438 Method of producing a reflective mask and method of producing a semiconductor device
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US Patent 7300724 Interference multilayer capping design for multilayer reflective mask blanks
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US Patent 7303844 Marking system for a semiconductor wafer to identify problems in mask layers
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US Patent 7306881 Method and system of lithography using masks having gray-tone features
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US Patent 7306882 Phase shift mask including a substrate with recess
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US Patent 7309549 Method for quartz bump defect repair with less substrate damage
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US Patent 7312003 Design and layout of phase shifting photolithographic masks
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US Patent 7312004 Embedded attenuated phase shift mask with tunable transmission
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US Patent 7312021 Holographic reticle and patterning method
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US Patent 7314689 System and method for processing masks with oblique features
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US Patent 7314690 Photomask producing method and photomask blank
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US Patent 7316870 Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program
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US Patent 7316871 Laser mask and crystallization method using the same
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US Patent 7316872 Etching bias reduction
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US Patent 7323276 Substrate for photomask, photomask blank and photomask
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US Patent 7323277 Photomask
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US Patent 7326502 Multilayer coatings for EUV mask substrates
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US Patent 7329474 Photomask blank, photomask, and method of manufacture
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US Patent 7329475 Method of selecting photomask blank substrates
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US Patent RE40084 Optical proximity correction
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US Patent 7332250 Photomask
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US Patent 7344805 Mask and method for producing thereof and a semiconductor device using the same
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US Patent 7344806 Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask
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US Patent 7344807 Gassing-free exposure mask
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US Patent 7344808 Method of making photomask blank substrates
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US Patent 7344824 Alternating aperture phase shift photomask having light absorption layer
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US Patent 7348105 Reflective maskblanks
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US Patent 7348106 Method for repairing a phase shift mask
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US Patent 7348108 Design and layout of phase shifting photolithographic masks
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US Patent 7351503 Fused silica pellicle in intimate contact with the surface of a photomask
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US Patent 7351504 Photomask blank substrate, photomask blank and photomask
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US Patent 7351505 Phase shift mask blank, phase shift mask, and pattern transfer method
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US Patent 7354683 Lithography mask for imaging of convex structures
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US Patent 7361433 Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same
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US Patent 7361434 Phase shift mask
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US Patent 7361436 Pattern formation method
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US Patent 7361457 Real-time configurable masking
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US Patent 7364821 Laser mask and method of crystallization using the same
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US Patent 7364822 Photomask, method for forming the same, and method for forming pattern using the photomask
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US Patent 7368204 Mask for laser crystallization and crystallization method using the same
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US Patent 7371484 Photomask blank and method of fabricating a photomask from the same
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US Patent 7378196 Method of manufacturing mask for correcting optical proximity effect
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US Patent 7378197 Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC
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US Patent 7381502 Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle
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US Patent 7384712 Photo mask, exposure method using the same, and method of generating data
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US Patent 7387853 Use of a planarizing layer to improve multilayer performance in ultraviolet masks
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US Patent 7399558 Mask and manufacturing method thereof and exposure method
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US Patent 7517617 Mask blank for use in EUV lithography and method for its production
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US Patent 7579122 Method of exposure and attenuated type phase shift mask
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US Patent 7629088 Mask defect repairing method and semiconductor device manufacturing method
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US Patent 7820343 Method for producing a photomask, method for patterning a layer or layer stack and resist stack on a mask substrate
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US Patent 7923179 Exposure mask and pattern forming method therefor
Edits on 7 Dec, 2021
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edited on 7 Dec, 2021
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Patent primary examiner of
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US Patent 7923179 Exposure mask and pattern forming method therefor
Edits on 6 Dec, 2021
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Golden AI
edited on 6 Dec, 2021
Edits on 3 Dec, 2021
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Golden AI
edited on 3 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7629088 Mask defect repairing method and semiconductor device manufacturing method
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Golden AI
edited on 2 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7579122 Method of exposure and attenuated type phase shift mask
Edits on 2 Dec, 2021
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Golden AI
edited on 2 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7517617 Mask blank for use in EUV lithography and method for its production
Edits on 30 Nov, 2021
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Golden AI
edited on 30 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7399558 Mask and manufacturing method thereof and exposure method
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Golden AI
edited on 30 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7387853 Use of a planarizing layer to improve multilayer performance in ultraviolet masks
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Golden AI
edited on 30 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7384712 Photo mask, exposure method using the same, and method of generating data
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Golden AI
edited on 30 Nov, 2021
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Golden AI
edited on 29 Nov, 2021
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Golden AI
edited on 29 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7378196 Method of manufacturing mask for correcting optical proximity effect
Edits on 26 Nov, 2021
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Golden AI
edited on 26 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7371484 Photomask blank and method of fabricating a photomask from the same
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Golden AI
edited on 26 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7368204 Mask for laser crystallization and crystallization method using the same
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Golden AI
edited on 26 Nov, 2021
Golden AI profile picture
Golden AI
edited on 26 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7364821 Laser mask and method of crystallization using the same
Edits on 25 Nov, 2021
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Golden AI
edited on 25 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7361457 Real-time configurable masking
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Golden AI
edited on 25 Nov, 2021
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Golden AI
edited on 25 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7361436 Pattern formation method
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Golden AI
edited on 25 Nov, 2021
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Infobox
Patent primary examiner of
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US Patent 7361434 Phase shift mask

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