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Sin J Lee

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Edits on 15 Dec, 2021
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Golden AI
edited on 15 Dec, 2021
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Patent primary examiner of
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US Patent 11166895 Hair care compositions comprising thiolactic acid-based ionic liquids or thiolactic acid-based ionic mixtures
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US Patent 7144674 Positive resist composition
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US Patent 7264913 Antireflective compositions for photoresists
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US Patent 7341828 Thiol compound, photopolymerization initiator composition and photosensitive composition
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US Patent 7393627 Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS)
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US Patent 7396633 Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition
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US Patent 7399581 Photoresist topcoat for a photolithographic process
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US Patent 7405028 Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography
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US Patent 7407733 Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0
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US Patent 7407735 Light sensitive planographic printing plate precursor and its processing method
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US Patent 7416835 Polymerizable composition
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US Patent 7422839 Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern
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US Patent 7425399 Composition for forming anti-reflective coating for use in lithography
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US Patent 7425402 Heat-sensitive lithographic printing plate precursor
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US Patent 7435532 Lithographic printing plate precursor
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US Patent 7439010 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same
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US Patent 7459261 Resist composition and patterning process using the same
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US Patent 7470499 Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition
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US Patent 7473513 Photosensitive metal nanoparticle and method of forming conductive pattern using the same
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US Patent 7476486 Resist composition and patterning process
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US Patent 7476487 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same
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US Patent 7476489 Low-temperature curable photosensitive compositions
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US Patent 7485407 Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition
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US Patent 7485408 Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
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US Patent 7485409 Planographic printing plate precursor
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US Patent 7494764 Negative photosensitive resin composition
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US Patent 7498126 Photoacid generators, chemically amplified resist compositions, and patterning process
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US Patent 7501222 Photoresist monomer polymer thereof and photoresist composition including the same
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US Patent 7510816 Silicon-containing resist composition and patterning process
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US Patent 7510822 Stimulation sensitive composition and compound
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US Patent 7511179 Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer
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US Patent 7514197 Resist and method of forming resist pattern
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US Patent 7514200 Hard mask composition for lithography process
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US Patent 7514203 Positive photoresist composition
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US Patent 11185067 Attractants for rats
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US Patent 7517635 Polyester compound and resist material using the same
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US Patent 7517636 Photosensitive resin composition, photosensitive element, production method of resist pattern and production method for printed circuit board
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US Patent 7521168 Resist composition for electron beam, EUV or X-ray
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US Patent 7524610 Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound
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US Patent 7524613 Material for the treatment of lithographic substrates and lithographic printing plates
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US Patent 7524617 Low-temperature curable photosensitive compositions
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US Patent 7531286 Radiation-sensitive resin composition
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US Patent 7531290 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
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US Patent 7534549 Photoresist polymer, and photoresist composition
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US Patent 7534554 Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition
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US Patent 7537879 Photoresist composition for deep UV and process thereof
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US Patent 7547501 Photoactive compounds
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US Patent 7547503 Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
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US Patent 7550247 Resist composition and patterning process
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US Patent 7560222 Si-containing polymers for nano-pattern device fabrication
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US Patent 7563563 Wet developable bottom antireflective coating composition and method for use thereof
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US Patent 7566527 Fused aromatic structures and methods for photolithographic applications
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US Patent 7569326 Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
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US Patent 7569328 Resin composition and thermo/photosensitive composition
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US Patent 7575846 Resist polymer and resist composition
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US Patent 7579131 Positive resist composition and method of forming resist pattern using the same
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US Patent 7579133 Processless lithographic printing plate precursor
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US Patent 7582410 Laser-decomposable resin composition and pattern-forming material using the same
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US Patent 7592128 On-press developable negative-working imageable elements
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US Patent 7598015 Polymer, resist composition and patterning process
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US Patent 7601479 Polymer, resist composition and patterning process
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US Patent 7601486 Ultra dark polymer
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US Patent 7604917 Polymer, top coating layer, top coating composition and immersion lithography process using the same
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US Patent 7604918 Photosensitive polymer and photoresist composition having the same
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US Patent 7604919 Monomer, polymer and composition for photoresist
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US Patent 7608380 Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
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US Patent 7608381 Polymer compound, positive resist composition and process for forming resist pattern
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US Patent 7608389 Photoresists processable under biocompatible conditions for multi-biomolecule patterning
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US Patent 7615332 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
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US Patent 7618763 Resist composition and patterning process
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US Patent 7622240 Low blur molecular resist
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US Patent 7622242 Resist composition and patterning process
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US Patent 7625687 Silsesquioxane resin
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US Patent 7632624 Photoresist undercoat-forming material and patterning process
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US Patent 7635554 Positive resist composition and pattern forming method
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US Patent 7638256 Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process
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US Patent 7648816 Positive resist composition, method for forming resist pattern and compound
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US Patent 7648820 Antireflective hardmask and uses thereof
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US Patent 7651829 Positive resist material and pattern formation method using the same
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US Patent 7651830 Patterned photoacid etching and articles therefrom
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US Patent 7655365 Wettability variable substrate and wettability variable layer forming composition
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US Patent 7655377 Antireflection film and exposure method
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US Patent 7655378 Negative resist composition and patterning process using the same
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US Patent RE41128 Organic anti-reflective coating compositions for advanced microlithography
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US Patent 7666572 Resist top coat composition and patterning process
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US Patent 7678529 Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method
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US Patent 7678530 Lactone-containing compound, polymer, resist composition, and patterning process
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US Patent 7678534 Mask for forming landing plug contact hole and plug forming method using the same
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US Patent 7687219 Positive resist composition and pattern formation method using the positive resist composition
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US Patent 7687221 Positive resist composition and resist pattern forming method
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US Patent 7687222 Polymerizable ester compounds, polymers, resist compositions and patterning process
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US Patent 7687223 Underlayer coating forming composition for lithography containing cyclodextrin compound
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US Patent 7691561 Positive resist compositions and patterning process
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US Patent 7695887 Method for producing pattern-forming body
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US Patent 7695893 Photo-sensitive compound and photoresist composition including the same
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US Patent 7700261 Positive photosensitive composition and a pattern-forming method using the same
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US Patent 7718342 Polymers, resist compositions and patterning process
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US Patent 7718344 Resist composition and pattern forming method using the same
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US Patent 7727701 Positive resist composition and method of forming resist pattern
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US Patent 7727704 Positive resist compositions and patterning process
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US Patent 7727705 High etch resistant underlayer compositions for multilayer lithographic processes
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US Patent 7736842 Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern
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US Patent 7741009 Positive resist composition and method of forming resist pattern
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US Patent 7745093 Water soluble resin composition and method for pattern formation using the same
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US Patent 7745098 Polymer compound, positive resist composition and method of forming resist pattern
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US Patent 7745099 Photosensitive compound and photoresist composition including the same
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US Patent 7745100 Polymers, methods of use thereof, and methods of decomposition thereof
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US Patent 7749677 Negative resist composition
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US Patent 7749680 Photoresist composition and method for forming pattern of a semiconductor device
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US Patent 7763412 Polymer, positive resist composition and method for forming resist pattern
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US Patent 7767378 Method for producing resist composition and resist composition
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US Patent 7771912 Positive resist composition and pattern forming method using the same
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US Patent 7771913 Resist composition and patterning process using the same
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US Patent 7771914 Resist composition and patterning process
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US Patent 7771919 High refractive index fluids for immersion lithography
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US Patent 7776509 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
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US Patent RE41580 Lactone-containing compounds, polymers, resist compositions, and patterning method
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US Patent 7781144 Positive resist composition and resist pattern forming method
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US Patent 7785766 Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film
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US Patent 7794914 Chemically amplified positive resist composition
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US Patent 7799516 Polymers, methods of use thereof, and methods of decomposition thereof
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US Patent 7803519 Method for manufacturing a semiconductor device
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US Patent 7816067 Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative
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US Patent 7824836 Photosensitive composition and pattern forming method using the same
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US Patent 7824845 Functionalized carbosilane polymers and photoresist compositions containing the same
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US Patent 7833690 Photoacid generators and lithographic resists comprising the same
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US Patent 7834213 Colorant compound and method of manufacturing the same as well as blue resist composition for use in color filter containing the same
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US Patent 7846638 Composition for forming anti-reflective coating for use in lithography
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US Patent 7851124 Composition for forming wiring protective film and uses thereof
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US Patent 7851125 Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
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US Patent 7851130 Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition
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US Patent 7855043 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
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US Patent 7855045 Immersion topcoat materials with improved performance
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US Patent 7858286 Positive resist composition and method for forming resist pattern
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US Patent 7858287 Photosensitive resin, and photosensitive composition
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US Patent 7867689 Method of use for photopatternable dielectric materials for BEOL applications
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US Patent 7871751 Resist composition
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US Patent 7875417 Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
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US Patent 7879526 Hardmask compositions for resist underlayer films
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US Patent 7883827 Polymerizable composition and planographic printing plate precursor
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US Patent 7883828 Functionalized carbosilane polymers and photoresist compositions containing the same
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US Patent 7887988 Positive resist composition and pattern forming method using the same
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US Patent 7887991 Positive resist composition and patterning process using the same
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US Patent 7892719 Photonic crystal EUV photoresists
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US Patent 7892720 Negative photosensitive fluorinated aromatic resin composition
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US Patent 7893293 Chemically amplified positive resist composition
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US Patent 7897321 Monomer, resin, resist composition using the resin, and method producing semiconductor device using the resist composition
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US Patent 7901868 Photoresist topcoat for a photolithographic process
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US Patent 7906268 Positive resist composition for immersion exposure and pattern-forming method using the same
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US Patent 7906269 Positive-type resist composition
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US Patent 7910290 Photoresist topcoat for a photolithographic process
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US Patent 7919225 Photopatternable dielectric materials for BEOL applications and methods for use
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US Patent 7923195 Positive resist composition and patterning process using the same
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US Patent 7927780 Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator
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US Patent 7932014 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
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US Patent 7939241 (Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method
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US Patent 7939243 Resin, resist composition and method of forming resist pattern
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US Patent 7947423 Photosensitive compound and photoresist composition including the same
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US Patent 7951524 Self-topcoating photoresist for photolithography
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US Patent 7960095 Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates
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US Patent 7964331 Positive resist composition and method of forming resist pattern
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US Patent 7968275 Method of forming a pattern using a photoresist composition for immersion lithography
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US Patent 7968276 Positive resist composition and method of forming resist pattern
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US Patent 7972763 Chemically amplified positive resist composition
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US Patent 7977028 Photosensitive resin composition and adhesion promoter
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US Patent 7977029 Positive photosensitive composition
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US Patent 7977030 Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming
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US Patent 7989137 Resist composition and pattern-forming method using the same
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US Patent 7993811 Positive resist compositions and patterning process
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US Patent 8003294 Photosensitive composition, compound used for photosensitive composition and pattern-forming method using photosensitive composition
Edits on 8 Dec, 2021
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Golden AI
edited on 8 Dec, 2021
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Golden AI
edited on 8 Dec, 2021
Edits made to:
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Infobox
Patent primary examiner of
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US Patent 7993811 Positive resist compositions and patterning process
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Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7989137 Resist composition and pattern-forming method using the same
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Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7977028 Photosensitive resin composition and adhesion promoter
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Golden AI
edited on 8 Dec, 2021
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7977029 Positive photosensitive composition
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Golden AI
edited on 8 Dec, 2021
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Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7972763 Chemically amplified positive resist composition
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Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7968275 Method of forming a pattern using a photoresist composition for immersion lithography
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Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7968276 Positive resist composition and method of forming resist pattern
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Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7964331 Positive resist composition and method of forming resist pattern
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Golden AI
edited on 7 Dec, 2021
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Golden AI
edited on 7 Dec, 2021
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Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7951524 Self-topcoating photoresist for photolithography
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Golden AI
edited on 7 Dec, 2021
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Infobox
Patent primary examiner of
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US Patent 7947423 Photosensitive compound and photoresist composition including the same
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Golden AI
edited on 7 Dec, 2021
Golden AI profile picture
Golden AI
edited on 7 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
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US Patent 7939243 Resin, resist composition and method of forming resist pattern
Edits on 7 Dec, 2021
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Golden AI
edited on 7 Dec, 2021
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Golden AI
edited on 7 Dec, 2021
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Golden AI
edited on 7 Dec, 2021
Edits made to:
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Infobox
Patent primary examiner of
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US Patent 7923195 Positive resist composition and patterning process using the same
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Golden AI
edited on 7 Dec, 2021
Edits made to:
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Infobox
Patent primary examiner of
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US Patent 7919225 Photopatternable dielectric materials for BEOL applications and methods for use

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