John S. Chu

US Patent 7087357 Photoreactive resin composition, method for making circuit substrate using same, and method for making ceramic multilayer substrate using same

US Patent 7090957 Polymerizable composition and planographic printing plate precursor using the same

US Patent 7090958 Positive photoresist compositions having enhanced processing time

US Patent 7090968 Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same

US Patent 7101650 Photosensitive resin composition for photoresist

US Patent 7101651 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process

US Patent 7101652 Photosensitive resin compositions

US Patent 7105269 Copolymer, polymer mixture, and radiation-sensitive resin composition

US Patent 7105273 Positive resist composition

US Patent 7105275 Positive resist composition and method of forming pattern using the same

US Patent 7118844 Diazonium salt and thermal recording material using the same

US Patent 7119156 Resist resin

US Patent 7125643 Polymers, resist compositions and patterning process

US Patent 7129011 Photosensitive resin compositions

US Patent 7132205 Positive photosensitive resin compositions

US Patent 7132213 Positive photoresist composition and method of forming resist pattern

US Patent 7132218 Chemically amplified positive resist composition

US Patent 7132220 Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective film

US Patent 7141351 Basic compound, resist composition and patterning process

US Patent 7141352 Basic compound, resist composition and patterning process

US Patent 7141355 Radiation-sensitive resin composition

US Patent 7144662 Photoresist composition having a high heat resistance

US Patent 7144683 Photopatternable molecular circuitry

US Patent 7147983 Dyed photoresists and methods and articles of manufacture comprising same

US Patent 7147995 Developing solution for heat-sensitive lithographic printing plate precursor and method for preparing lithographic printing plate

US Patent 7150947 Photosensitive polymer composition, method of forming relief patterns, and electronic equipment

US Patent 7150956 Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device

US Patent 7153631 Pattern-forming process using photosensitive resin composition

US Patent 7166418 Sulfonamide compound, polymer compound, resist material and pattern formation method

US Patent 7169531 Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives

US Patent 7172847 Planographic printing plate precursor and planographic printing plate precursor laminate

US Patent 7172851 Light sensitive composition, planographic printing plate material, and image formation method

US Patent 7175960 Positive resist composition and patterning process

US Patent 7175961 Photopatternable molecular circuitry

US Patent 7179581 Resist composition and patterning process

US Patent 7179584 Exposure method and device for forming patterns on printed wiring board

US Patent 7189491 Photoresist composition for deep UV and process thereof

US Patent 7189492 Photosensitive composition and pattern forming method using the same

US Patent 7195849 Photosensitive resin compositions

US Patent 7195854 Photoresist composition

US Patent 7195863 Development defect preventing process and material

US Patent 7198877 Heat-sensitive lithographic printing plate precursor

US Patent 7198878 Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance

US Patent 7198886 Method for forming pattern

US Patent 7205083 Recording material

US Patent 7205084 Heat-sensitive lithographic printing plate precursor

US Patent 7205085 Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern

US Patent 7205086 Multilayer elements containing photoresist compositions and their use in microlithography

US Patent 7208249 Method of producing a patterned photoresist used to prepare high performance photomasks

US Patent 7211366 Photoresist composition for deep ultraviolet lithography

US Patent 7214454 Positively photosensitive insulating resin composition and cured object obtained therefrom

US Patent 7214455 Photosensitive resin composition and process for producing heat-resistant resin film

US Patent 7214465 Positive photosensitive composition

US Patent 7214474 Wash composition with polymeric surfactant

US Patent 7217489 Planographic printing plate

US Patent 7220520 Photosensitive resin compositions

US Patent 7220529 Photopolymerizable composition and recording material using the same

US Patent 7220530 Light sensitive planographic printing plate material

US Patent 7223516 Positive type photoresist composition

US Patent 7226715 Image recording material

US Patent 7229737 Photopolymerizable composition and recording material and recording process using the same

US Patent 7232637 Light sensitive media for optical devices using organic mesophasic materials

US Patent 7232642 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same

US Patent 7232650 Planar inorganic device

US Patent 7238455 Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device

US Patent 7241554 Photosensitive composition and method for forming pattern using same

US Patent 7250245 Switchable polymer printing plates with carbon bearing ionic and steric stabilizing groups

US Patent 7252922 Image recording material

US Patent 7255970 Photoresist composition for imaging thick films

US Patent 7255976 Laser-engravable flexo printing elements for the production of flexo printing forms containing blends of hydrophilic polymers and hydrophobic elastomers

US Patent 7258961 Planorgraphic printing plate precursor

US Patent 7264914 Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography

US Patent 7270928 Isocyanate composition, microcapsule and production method thereof, and recording material

US Patent 7270935 Cyanoadamantyl compounds and polymers and photoresists comprising same

US Patent 7279256 Photoresist polymer and photoresist composition containing the same

US Patent 7279263 Dual-wavelength positive-working radiation-sensitive elements

US Patent 7282316 Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same

US Patent 7282323 Highly heat-resistant, negative-type photosensitive resin composition

US Patent 7288360 Image recording material

US Patent 7288363 Chemically amplified positive resist composition and patterning process

US Patent 7291438 Negative photosensitive composition and negative photosensitive lithographic printing plate

US Patent 7291439 Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same

US Patent 7291441 Positive resist composition and pattern forming method utilizing the same

US Patent 7291442 Photosensitive polymeric material for WORM optical data storage with two-photon fluorescent readout

US Patent 7294447 Positive-working lithographic printing plate precursor

US Patent 7297452 Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel

US Patent 7297466 Method of forming a photoresist pattern and method for patterning a layer using a photoresist

US Patent 7300738 Azolinyl acetic acid derivative and azolinyl acetic acid derivative containing recording material

US Patent 7303849 Planographic printing plate precursor

US Patent 7303857 Photosensitive composition and planographic printing plate precursor

US Patent 7303859 Photoresist, photolithography method using the same, and method for producing photoresist

US Patent 7306897 Preparation method of printing plate material and printing plate material

US Patent 7309750 Cyanoadamantyl compounds and polymers

US Patent 7312014 Resist compositions

US Patent 7312016 Chemically amplified positive resist composition and patterning process

US Patent 7314691 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device

US Patent 7314698 Polymerizable composition and planographic printing plate precursor using the same

US Patent 7316885 Method of forming resist pattern, positive resist composition, and layered product

US Patent 7316888 Positive type resist composition and resist pattern formation method using same

US Patent 7316889 Positive type resist composition and resist pattern formation method using same

US Patent 7316892 Process of preparing planographic printing plate

US Patent 7318995 Method of making a negative-working lithographic printing plate

US Patent 7323284 Negative type radiation sensitive resin composition

US Patent 7323286 Photosensitive composition, compound used in the same, and patterning method using the same

US Patent 7323287 Positive type resist composition and resist pattern formation method using same

US Patent 7326510 Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties

US Patent 7326515 Positive type resist composition and resist pattern formation method using same

US Patent 7329478 Chemical amplified positive photo resist composition and method for forming resist pattern

US Patent 7332254 Positive photosensitive insulating resin composition, cured product thereof, and electronic component

US Patent 7335457 Positive-tone radiation-sensitive resin composition

US Patent 7335458 Chemically amplified positive resist composition and patterning process

US Patent 7338737 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel

US Patent 7338747 Photoresist composition and method pattern forming using the same

US Patent 7338749 Process for making flexographic printing plate

US Patent 7338755 Photosensitive composition and method for forming pattern using same

US Patent 7341815 Planographic printing plate precursor

US Patent 7341816 Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers

US Patent 7341817 Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition

US Patent 7344820 Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same

US Patent 7348122 Photosensitive resin composition and method for manufacturing semiconductor device using the same

US Patent 7351521 Photoresist composition for deep ultraviolet lithography

US Patent 7358025 Photoresist undercoat-forming material and patterning process

US Patent 7361444 Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof

US Patent 7361445 Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device

US Patent 7361451 Lithographic printing plate precursor and lithographic printing method using the same

US Patent 7361455 Anti-reflective coatings

US Patent 11181822 Resist composition and method of forming resist pattern

US Patent 7364831 Positive resist composition and resist pattern formation method

US Patent 7368205 Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device

US Patent 7368215 On-press developable IR sensitive printing plates containing an onium salt initiator system

US Patent 7368216 Photosensitive resin composition and manufacturing method of semiconductor device using the same

US Patent 7368544 Polymerizable composition and planographic printing plate precursor using the same

US Patent 7371499 Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same

US Patent 7371500 Positive photosensitive insulating resin composition and cured product thereof

US Patent 7371501 Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same

US Patent 7371503 Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition

US Patent 7371505 Photosensitive composition and method for forming pattern using the same

US Patent 7374856 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film

US Patent 7374860 Positive resist composition and pattern forming method using the same

US Patent 7378215 Positive photoresist composition

US Patent 7378218 Polymer, resist composition and patterning process

US Patent 7378230 Photoresist composition for multi-micro nozzle head coater

US Patent 7390612 Positive type resist composition and resist pattern formation method using same

US Patent 7399569 Method for producing microcapsules, microcapsules, recording material, and heat-sensitive recording material

US Patent 7399576 Positive-working radiation-sensitive composition and elements

US Patent 7402372 Positive resist composition and method of forming resist pattern

US Patent 7407731 Photosensitive resin compositions

US Patent 7410746 Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition

US Patent 7413843 Sulfonamide compound, polymer compound, resist material and pattern formation method

US Patent 7416822 Resin and resin composition

US Patent 7416830 Photosensitive resin compositions

US Patent 7419761 Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same

US Patent 7419763 Near-field exposure photoresist and fine pattern forming method using the same

US Patent 7432034 Negative resist composition

US Patent 7435525 Positive photosensitive resin composition, method for forming pattern, and electronic part

US Patent 7435530 Positive type resist composition and resist pattern formation method using same

US Patent 7439005 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern

US Patent 7439006 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

US Patent 7442485 Lithographic process involving on press development

US Patent 7452657 Resist composition, method of forming resist pattern, semiconductor device and method of manufacturing thereof

US Patent 7455948 Photosensitive resin composition

US Patent 7462436 Positive photoresist composition and method of forming resist pattern

US Patent 7468227 Method of reducing the average process bias during production of a reticle

US Patent 7468234 Planographic printing plate precursor

US Patent 7473515 Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use

US Patent 7476488 Photosensitive composition and method for forming pattern using same

US Patent 7476492 Low activation energy photoresist composition and process for its use

US Patent 7485413 Photosensitive composition and method for forming pattern using same

US Patent 7488567 Polymer, resist composition and patterning process

US Patent 7488568 Resist composition, method of forming resist pattern, compound and acid generator

US Patent 7491483 Polymers, positive resist compositions and patterning process

US Patent 7491484 Photoresist compositions and methods of forming a pattern using the same

US Patent 7491485 Resist composition and method of forming resist pattern

US Patent 7494749 Photolithography using interdependent binary masks

US Patent 7494760 Photoacid generators, chemically amplified resist compositions, and patterning process

US Patent 7494761 Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist composition

US Patent 7494762 Positive resist composition for immersion lithography and method for forming resist pattern

US Patent 7494763 Polyhydric phenol compound and chemically amplified resist composition containing the same

US Patent 7498116 Resist composition and pattern formation method using the same

US Patent 7501221 Positive type resist composition and resist pattern formation method using same

US Patent 7501223 Polymer, resist composition and patterning process using the same

US Patent 7501224 Compositions for use in forming a pattern and methods of forming a pattern

US Patent 7504195 Photosensitive polymer and photoresist composition

US Patent 7504196 Positive resist composition, method for resist pattern formation and compound

US Patent 7507518 Photosensitive resin precursor composition

US Patent 7507522 Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers

US Patent 7511169 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

US Patent 7514199 Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same

US Patent 7514202 Thermal acid generator, resist undercoat material and patterning process

US Patent 7514204 Resist composition and patterning process

US Patent 11187982 Photosensitive resin composition, photosensitive dry film, and pattern forming process

US Patent 7521167 Ester group-containing poly (imide-azomethine) copolymer, ester group-containing poly (amide acid-azomethine) copolymer, and positive photosensitive resin composition

US Patent 7524594 Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films

US Patent 7524609 Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition

US Patent 7524611 Photosensitive polymeric material for worm optical data storage with two-photon fluorescent readout

US Patent 7527910 Salt suitable for an acid generator and a chemically amplified resist composition containing the same

US Patent 7527911 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition

US Patent 7527912 Photoacid generators, resist compositions, and patterning process

US Patent 7527913 Photoacid generators, photoresist composition including the same and method of forming pattern using the same

US Patent 7534548 Polymer for immersion lithography and photoresist composition

US Patent 7537880 Polymer, resist composition, and patterning process

US Patent 7541132 Chemically amplified resist material, topcoat film material and pattern formation method using the same

US Patent 7541133 Positive resist composition and patterning process

US Patent 7541138 Resist composition

US Patent 7544460 Resist composition, multilayer body, and method for forming resist pattern

US Patent 7544462 Radiation-sensitive composition and elements with basic development enhancers

US Patent 7566522 Chemically amplified resist composition

US Patent 7569323 Resist protective coating material and patterning process

US Patent 7569325 Monomer having sulfonyl group, polymer thereof and photoresist composition including the same

US Patent 7572570 Chemically amplified resist composition

US Patent 7575850 Chemically amplified resist composition

US Patent 7579132 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

US Patent 7582406 Resist composition and method for forming resist pattern

US Patent 7582409 Negative resist composition and method of forming resist pattern

US Patent 7592118 Positive resist composition and pattern forming method using the same

US Patent 7592119 Photosensitive polyimide resin composition

US Patent 7592125 Photoresist compositions comprising resin blends

US Patent 7592126 Positive resist composition and pattern forming method using the resist composition

US Patent 7598009 Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device

US Patent 7598016 Resist composition and patterning process

US Patent 7598017 Negative resist composition and method of forming resist pattern

US Patent 7601480 Photoactive compounds

US Patent 7604911 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device

US Patent 7604920 Positive resist composition, method of forming resist pattern, polymeric compound, and compound

US Patent 7604923 Image forming method

US Patent 7608382 Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers

US Patent 7611822 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

US Patent 7615322 Photoresist composition and method of manufacturing a color filter substrate by using the same

US Patent 7615324 Photosensitive composition, and cured relief pattern production method and semiconductor device using the same

US Patent 7615330 Positive resist composition and pattern formation method using the same

US Patent 7615331 Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device

US Patent 7618764 Positive resist compositions and patterning process

US Patent 7618765 Positive resist composition and patterning process

US Patent 7625690 Positive resist composition and pattern forming method using the same

US Patent 7629091 Polyimide compound and flexible wiring board

US Patent 7629105 Positive photoresist composition and method of forming resist pattern

US Patent 7629107 Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition

US Patent 7632623 Positive resist composition and pattern formation method using the positive resist composition

US Patent 7632630 Dyed photoresists and methods and articles of manufacture comprising same

US Patent 7635551 Poly (imide-azomethine) copolymer, poly (amic acid-azomethine) copolymer, and positive photosensitive resin composition

US Patent 7638253 Photoresist composition and method of manufacturing a thin-film transistor substrate using the same

US Patent 7638254 Positive photosensitive resin composition, method for forming pattern, and electronic part

US Patent 7638257 Positive resist composition and method of forming resist pattern

US Patent 7638258 Positive resist composition and method for resist pattern formation

US Patent 7638259 Polyimide resin soluble in aqueous alkaline solution, composition comprising the resin and cured coating prepared from the composition

US Patent 7638260 Positive resist compositions and patterning process

US Patent 7638264 Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use

US Patent 7642018 Photosensitive resin composition, pattern forming method and electronic parts using the photosensitive resin composition

US Patent 7645559 Positive resist composition and method of forming resist pattern

US Patent RE41083 Solvent resistant polymers with improved bakeablity features

US Patent 7648817 Positive working resist composition and pattern forming method

US Patent 7651831 Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use

US Patent 7651834 Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production

US Patent 7655379 Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions

US Patent 7666569 Positive resist composition and method for forming resist pattern

US Patent 7666573 Positive photosensitive resin composition and method for forming pattern

US Patent 7666574 Positive resist composition and pattern forming method

US Patent 7670746 Positive photosensitive composition and method of forming resist pattern

US Patent 7670749 Resist material and method for forming a patterned resist layer on a substrate

US Patent 7674566 Positive photosensitive resin composition

US Patent 7674567 Positive resist composition and pattern forming method using the same

US Patent 7678514 Positive-type photosensitive resin composition, cured film, protecting film, insulating film and semiconductor device and display device using these films

US Patent 7678531 Positive-working imageable elements

US Patent 7682772 Resist composition, method of forming resist pattern, novel compound, and acid generator

US Patent 7687208 Positive photosensitive resin composition

US Patent 7695875 Photo-sensitive composition

US Patent 7695892 Resist composition and pattern-forming method using same

US Patent 7700256 Phenolic/alicyclic copolymers and photoresists

US Patent 7700257 Photoresist composition and resist pattern formation method by the use thereof

US Patent 7704669 Acrylic polymer and radiation-sensitive resin composition

US Patent 7709177 Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof

US Patent 7709179 Negative resist composition and method for forming resist pattern

US Patent 7713679 Resist composition, method of forming resist pattern, novel compound, and acid generator

US Patent 7723007 Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method

US Patent 7736833 Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof

US Patent 7737227 Composition for an organic hard mask and method for forming a pattern on a semiconductor device using the same

US Patent 7740996 Photosensitive resin composition and color filter

US Patent 7741007 Chemicallly amplified resist composition

US Patent 7741008 Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method

US Patent 7741015 Patterning process and resist composition

US Patent 7745077 Composition for coating over a photoresist pattern

US Patent 7745096 Photosensitive polyimide composition, polyimide film and semiconductor device using the same

US Patent 7745097 Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern

US Patent 7749676 Positive type dry film photoresist and composition for preparing the same

US Patent 7759045 Chemically amplified positive resist composition

US Patent 7767377 Positive type resist composition, process for forming resist pattern, and process for performing ion implantation

US Patent 7767379 Polymer compound, positive resist composition, and method of forming resist pattern

US Patent 7776510 Resist composition, method of forming resist pattern, compound and acid generator

US Patent 7776511 Positive resist composition and method of forming resist pattern

US Patent 7776515 Method for forming a pattern on a semiconductor device using an organic hard mask

US Patent 7781131 Positive photosensitive resin composition, cured layer , protecting layer, insulating layer and semiconductor device and display therewith

US Patent 7781143 Negative-working imageable elements and methods of use

US Patent 7781153 Polymer resin composition, related method for forming a pattern, and related method for fabricating a capacitor

US Patent 7790345 Positive type dry film photoresist

US Patent 7794913 Chemically amplified positive resist composition

US Patent 7794915 Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method

US Patent 7794916 Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition

US Patent 7799505 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition

US Patent 7799506 Positive resist composition and pattern forming method using the same

US Patent 7799507 Positive resist composition for immersion lithography and method for forming resist pattern

US Patent 7799509 Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same

US Patent 7803510 Positive photosensitive polybenzoxazole precursor compositions

US Patent 7803512 Positive resist composition and method of forming resist pattern

US Patent 7803513 Chemically amplified resist composition

US Patent 7803521 Photoresist compositions and process for multiple exposures with multiple layer photoresist systems

US Patent 7807331 Hydrogenated ring-opening metathesis polymer, resist composition and patterning process

US Patent 7811726 Photoresist composition and method of manufacturing a color filter substrate by using the same

US Patent 7816066 Positive resist composition and method for forming resist pattern

US Patent 7820369 Method for patterning a low activation energy photoresist

US Patent 7833694 Lactone-containing compound, polymer, resist composition, and patterning process

US Patent 7838184 Azo dye compound, coloring composition, ink sheet for thermal transfer recording, thermal transfer recording method, color toner, ink for inkjet, and color filter

US Patent 7838199 Polymers and photoresist compositions

US Patent 7838201 Method for manufacturing a semiconductor device

US Patent 7842441 Norbornene polymer for photoresist and photoresist composition comprising the same

US Patent 7842452 Pattern forming method

US Patent 7851121 Photosensitive polyimide composition and polyimide precursor composition

US Patent 7851128 Photosensitive polymer composition, method of forming relief patterns, and electronic equipment

US Patent 7851140 Resist composition for negative tone development and pattern forming method using the same

US Patent 7855038 Mask patterns for semiconductor device fabrication and related methods and structures

US Patent 7855044 Positive resist composition and method of forming resist pattern

US Patent 7858275 Photosensitive resin composition and color filter

US Patent 7858292 Imageable elements with components having 1H-tetrazole groups

US Patent 7858721 Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films

US Patent 7862980 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

US Patent 7867690 Tertiary alcohol derivative, polymer compound and photoresist composition

US Patent 7867697 Positive photosensitive composition and method of forming resist pattern

US Patent 7871752 Lactone-containing compound, polymer, resist composition, and patterning process

US Patent 7871753 Positive resist composition and method of forming resist pattern

US Patent 7871754 Photosensitive composition

US Patent 7871755 Photosensitive composition

US Patent 7879527 Method of producing positive resist composition, positive resist composition, and method of forming resist pattern

US Patent 7887990 Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same

US Patent 7901867 Sulphonium salt initiators

US Patent 7901871 Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method

US Patent 7902385 Ester compounds and their preparation, polymers, resist compositions and patterning process

US Patent 7910281 Positive resist composition for thin-film implantation process and method for forming resist pattern

US Patent 7910282 Copolymer for semiconductor lithography and producing method thereof, and composition

US Patent 7910284 Materials for photoresist, photoresist composition and method of forming resist pattern

US Patent 7910285 Positive resist composition for immersion exposure and method of forming resist pattern

US Patent 7914968 Positive resist composition and method of forming resist pattern

US Patent 7919223 Compound for resist and radiation-sensitive composition

US Patent 7919226 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

US Patent 7919227 Positive resist composition and method of forming resist pattern

US Patent 7923200 Composition for coating over a photoresist pattern comprising a lactam

US Patent 7932012 Heat-resistant photosensitive resin composition, method for forming pattern using the composition, and electronic part

US Patent 7932013 Pattern coating material and pattern forming method

US Patent 7935474 Acid-amplifier having acetal group and photoresist composition including the same

US Patent 7943284 Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern

US Patent 7947421 Positive resist composition for immersion exposure and pattern-forming method using the same

US Patent 7955781 Negative-working photosensitive material and negative-working planographic printing plate precursor

US Patent 7955784 Photoresist composition and method of manufacturing a thin-film transistor substrate using the same

US Patent 7960089 Compound, method for producing same, positive resist composition and method for forming resist pattern

US Patent 7968269 Positive resist composition for immersion exposure and method of forming resist pattern

US Patent 7972754 Fluorinated polymer, negative photosensitive resin composition and partition walls

US Patent 7972761 Photoresist materials and photolithography process

US Patent 7972762 Positive resist composition and method of forming resist pattern

US Patent 7981589 Fluorinated monomer, fluorinated polymer, resist composition and patterning process

US Patent 7985528 Positive resist composition and patterning process

US Patent 7993812 Calixarene blended molecular glass photoresists and processes of use

US Patent 7998654 Positive resist composition and pattern-forming method

US Patent 7998656 Chemically amplified positive resist composition

US Patent 7998657 Ester compounds and their preparation, polymers, resist compositions and patterning process

US Patent 8003296 Chemically amplified positive resist composition

US Patent 8012664 Light-sensitive component for use in photoresists