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Kathleen Duda

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edited on 15 Dec, 2021
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Patent primary examiner of
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US Patent 7090967 Pattern transfer in device fabrication
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US Patent 7122296 Lithography pattern shrink process and articles
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US Patent 7125652 Immersion lithographic process using a conforming immersion medium
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US Patent 7125653 Method of producing conductive or semiconducting structured polymers
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US Patent 7132224 Pattern formation method
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US Patent 11175582 Photosensitive stacked structure
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US Patent 7135273 Pattern formation method
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US Patent 7144690 Photolithographic methods of using a single reticle to form overlapping patterns
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US Patent 7157211 Method of fabricating a semiconductor device
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US Patent 7163780 Electronic device manufacture
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US Patent 7169540 Method of treatment of porous dielectric films to reduce damage during cleaning
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US Patent 7175972 Method for fabricating a thin film magnetic head
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US Patent 7189479 Phototool coating
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US Patent 7198885 Circuit fabrication method
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US Patent 7211370 Method for dicing wafer
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US Patent 7214473 Method for removing patterned layer from lower layer through reflow
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US Patent 7217503 Exposure method and apparatus
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US Patent 7224030 Method and apparatus for producing rectangular contact holes utilizing side lobe formation
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US Patent 7229745 Lithographic semiconductor manufacturing using a multi-layered process
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US Patent 7235348 Water soluble negative tone photoresist
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US Patent 7250247 Photolithographic structures using multiple anti-reflecting coatings
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US Patent 7255978 Multi-level optical structure and method of manufacture
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US Patent 7258965 Pre-exposure of patterned photoresist films to achieve critical dimension reduction during temperature reflow
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US Patent 7258966 Method for manufacturing a diffuser for a backlight module
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US Patent 7267926 Active energy beam curing type conductive paste, production method and device for conductor circuit substrate and non-contact ID and production method thereof
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US Patent 7270941 Method of passivating of low dielectric materials in wafer processing
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US Patent 7276328 Lithography mask utilizing asymmetric light source
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US Patent 7279267 Method for manipulating the topography of a film surface
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US Patent 7279270 Manufacturing method of composite film, composite film, color filter made of composite film, display apparatus provided with color filter
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US Patent 7285378 Juxtaposed island manufacturing method by means of self-organised deposition on a substrate and structure obtained using said method
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US Patent 7291446 Method and system for treating a hard mask to improve etch characteristics
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US Patent 7297471 Method for manufacturing an array of interferometric modulators
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US Patent 7303860 System and method for performing multi-resolution lithography
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US Patent 7303861 Apparatus and method for making a forming structure
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US Patent 7303862 Microfabrication methods and devices
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US Patent 7318996 Method for forming patterned insulating elements and methods for making electron source and image display device
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US Patent 7326509 Composition for forming anti-reflective coating for use in lithography
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US Patent 7332264 Photo-definable self-assembled materials
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US Patent 7341827 Separation-material composition for photo-resist and manufacturing method of semiconductor device
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US Patent 7344825 Method of fabricating semiconductor device, and developing apparatus using the method
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US Patent 7354697 Process for producing wiring circuit board
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US Patent 7364832 Wet developable hard mask in conjunction with thin photoresist for micro photolithography
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US Patent 7364839 Method for forming a pattern and substrate-processing apparatus
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US Patent 7371507 Methods for fabricating semiconductor devices
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US Patent 7374867 Enhancing photoresist performance using electric fields
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US Patent 7379153 Lithographic apparatus and device manufacturing method
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US Patent 7381507 Photo-patterned light polarizing films
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US Patent 7384727 Semiconductor processing patterning methods
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US Patent 7384728 Method of fabricating a semiconductor device
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US Patent 7387868 Treatment of a dielectric layer using supercritical CO
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US Patent 7390616 Method for post lithographic critical dimension shrinking using post overcoat planarization
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US Patent 7399579 Fabrication of metallic microstructures via exposure of photosensitive composition
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US Patent 7402377 Use of perfluoro-n-alkanes in vacuum ultraviolet applications
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US Patent 7410748 Method of etching materials patterned with a single layer 193nm resist
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US Patent 7419771 Method for forming a finely patterned resist
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US Patent 7429446 Resist pattern forming method and semiconductor device fabrication method
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US Patent 7432040 Manufacturing method of thick film member pattern
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US Patent 7432041 Method and systems to print contact hole patterns
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US Patent 7435535 Method for forming patterned insulating elements and methods for making electron source and image display device
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US Patent 7455955 Planarization method for multi-layer lithography processing
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US Patent 7459264 Device manufacturing method
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US Patent 7470503 Method for reducing lithography pattern defects
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US Patent 7470504 Reflective film interface to restore transverse magnetic wave contrast in lithographic processing
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US Patent 7473517 Supercritical developing for a lithographic process
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US Patent 7473523 Systems and methods for modifying features in a semi-conductor device
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US Patent 7485410 Method of manufacturing thick dielectric pattern and method of manufacturing image displaying apparatus
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US Patent 7488570 Method of forming metal pattern having low resistivity
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US Patent 7498118 Apparatus for removing liquid in immersion lithography process and method of immersion lithography
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US Patent 7498119 Process for forming a feature by undercutting a printed mask
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US Patent 7501227 System and method for photolithography in semiconductor manufacturing
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US Patent 7504199 Method of forming metal pattern having low resistivity
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US Patent 11187984 Resist patterning method and resist material
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US Patent 7521156 Photo mask and method of correcting the transmissivity of a photo mask
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US Patent 7524616 Applications of semiconductor nano-sized particles for photolithography
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US Patent 7524618 Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof
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US Patent 7527917 Exposure method and exposure apparatus
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US Patent 7527920 Active hardmask for lithographic patterning
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US Patent 7531295 Method and apparatus for lithographic imaging using asymmetric illumination
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US Patent 7531296 Method of forming high etch resistant resist patterns
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US Patent 7534553 Method for fabricating semiconductor device
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US Patent 7541137 Resist resolution using anisotropic acid diffusion
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US Patent 7556891 Method and apparatus for contact hole unit cell formation
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US Patent 7556914 Pattern formation method
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US Patent 7556917 Method for manufacturing an array of interferometric modulators
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US Patent 7563560 Solution and method for manufacturing an integrated circuit
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US Patent 7563561 Pattern forming method and a semiconductor device manufacturing method
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US Patent 7575853 Method of forming thin film pattern and method of forming magnetoresistive element
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US Patent 7579135 Lithography apparatus for manufacture of integrated circuits
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US Patent 7579137 Method for fabricating dual damascene structures
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US Patent 7592129 Method for forming photoresist pattern and method for manufacturing semiconductor device
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US Patent 7595142 Pattern formation method
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US Patent 7595145 Method of forming pattern of semiconductor device
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US Patent 7601485 Exposure method
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US Patent 7604928 Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film transistor
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US Patent 7618754 Pattern formation method
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US Patent 7632625 Method of pre-exposing relief image printing plate
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US Patent 7642020 Method for separating optical and resist effects in process models
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US Patent 7648819 Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system
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US Patent 7655385 Pattern formation method
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US Patent 7662543 Pattern forming method and method of manufacturing semiconductor device
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US Patent 7666576 Exposure scan and step direction optimization
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US Patent 7670729 Measurement method and apparatus, exposure apparatus, and device fabrication method
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US Patent 7678516 Test structures and methods for monitoring or controlling a semiconductor fabrication process
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US Patent 7687227 Resist pattern forming method and manufacturing method of semiconductor device
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US Patent 7695896 Method for forming photoresist pattern
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US Patent 7695897 Structures and methods for low-k or ultra low-k interlayer dielectric pattern transfer
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US Patent 7700267 Immersion fluid for immersion lithography, and method of performing immersion lithography
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US Patent 7700268 Exposure system and pattern formation method using the same
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US Patent 7704683 Process for producing patterned optical filter layers on substrates
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US Patent 7709186 Method for exposing photoresist film of semiconductor device
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US Patent 7709187 High resolution imaging process using an in-situ image modifying layer
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US Patent 7713682 Substrate, method of exposing a substrate, machine readable medium
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US Patent 7713683 Apparatus and method for making a forming structure
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US Patent 7713685 Exposure system and pattern formation method
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US Patent 7718346 Method of forming wiring pattern and method of manufacturing TFT substrate using the same
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US Patent 7718349 Method for producing submicron structures
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US Patent 7723015 Method for manufacturing an array of interferometeric modulators
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US Patent 7727707 Barrier film material and pattern formation method using the same
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US Patent 7727708 Method for fabricating dual damascene structures
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US Patent 7727709 Method of forming resist pattern and method of manufacturing semiconductor device
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US Patent 7732108 Method for OPC model generation
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US Patent 7732123 Immersion photolithography with megasonic rinse
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US Patent 7736841 Reflective film interface to restore transverse magnetic wave contrast in lithographic processing
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US Patent 7741012 Method for removal of immersion lithography medium in immersion lithography processes
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US Patent 7741013 Process for thick film circuit patterning
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US Patent 7741014 Patterning and alteration of molecules
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US Patent 7749665 Method of generating writing pattern, method of forming resist pattern, method of controlling exposure tool, and method of manufacturing semiconductor device
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US Patent 7749684 Method for manufacturing conductive pattern forming body
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US Patent 7749689 Methods for providing a confined liquid for immersion lithography
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US Patent 7763396 Method and apparatus for fabricating semiconductor chips using varying areas of precision
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US Patent 7763416 Fabrication method of active device array substrate
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US Patent 7767385 Method for lithography for optimizing process conditions
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US Patent 7767386 Method of patterning an organic planarization layer
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US Patent 7771917 Methods of making templates for use in imprint lithography
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US Patent 7771918 Semiconductor manufacturing apparatus and pattern formation method
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US Patent 7776516 Graded ARC for high NA and immersion lithography
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US Patent 7781149 Reduced pitch multiple exposure process
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US Patent 7781150 Method of photolithographic exposure
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US Patent 7781151 Manufacturing method of fuel cell having micro sensors and polymer layers
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US Patent 7790335 Photomask and manufacturing method of semiconductor device
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US Patent 7790357 Method of forming fine pattern of semiconductor device
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US Patent 7794920 Pattern decomposition method for double exposure
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US Patent 7794921 Imaging post structures using x and y dipole optics and a single mask
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US Patent 7794922 Pattern forming method and method of manufacturing semiconductor device
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US Patent 7794923 Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device
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US Patent 7794924 Developing method and developing unit
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US Patent 7799511 Method of forming a contact hole
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US Patent 7799512 Method for forming ring pattern
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US Patent 7799514 Surface treatment with an acidic composition to prevent substrate and environmental contamination
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US Patent 7799515 Method of fabricating semiconductor device, and developing apparatus using the method
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US Patent 7803516 Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus
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US Patent 7803518 Method for manufacturing micro structure
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US Patent 7807335 Immersion lithography contamination gettering layer
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US Patent 7807337 Inductor for a system-on-a-chip and a method for manufacturing the same
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US Patent 7807340 Photoresists for visible light imaging
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US Patent 7820366 Method of writing identifying information on wafer
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US Patent 7824843 Pattern forming method, electronic device manufacturing method and electronic device
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US Patent 7824846 Tapered edge bead removal process for immersion lithography
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US Patent 7829262 Method of forming pitch multipled contacts
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US Patent 7829264 Method and system for providing a microelectronic device using a plurality of focus distances
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US Patent 7829269 Dual tone development with plural photo-acid generators in lithographic applications
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US Patent 7838202 Method for manufacturing patterned thin-film layer
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US Patent 7838205 Utilization of electric field with isotropic development in photolithography
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US Patent 7838206 Substrate processing method and substrate processing apparatus
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US Patent 7839485 Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method
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US Patent 7846623 Resist pattern and reflow technology
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US Patent 7846641 Glass substrate having circuit pattern and process for producing the same
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US Patent 7846642 Direct incident beam lithography for patterning nanoparticles, and the articles formed thereby
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US Patent 7846643 Method and system for providing a structure in a microelectronic device using a chromeless alternating phase shift mask
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US Patent 7846644 Photopatternable deposition inhibitor containing siloxane
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US Patent 7846645 Method and system for reducing line edge roughness during pattern etching
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US Patent 7846646 Resist pattern forming method, thin-film pattern forming method, and microdevice manufacturing method
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US Patent 7846647 Method of producing pattern-formed structure and photomask used in the same
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US Patent 7851136 Stabilization of deep ultraviolet photoresist
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US Patent 7851141 Flat panel display manufacturing
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US Patent 7862986 Patterning process
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US Patent 7862987 Method for forming an electrical structure comprising multiple photosensitive materials
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US Patent 7862988 Method for forming patterns of semiconductor device
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US Patent 7862991 Method for fabricating recess pattern in semiconductor device
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US Patent 7867692 Method for manufacturing a microstructure, exposure device, and electronic apparatus
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US Patent 7871758 Process for producing resist pattern and conductor pattern
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US Patent 7871759 Barrier film material and pattern formation method using the same
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US Patent 7875418 Method for a multiple exposure, microlithography projection exposure installation and a projection system
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US Patent 7879532 Method of manufacturing semiconductor device
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US Patent 7879536 Method for forming high-resolution pattern having desired thickness or high aspect ratio using dry film resist
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US Patent 7883836 Method for forming fine pattern with a double exposure technology
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US Patent 7887323 Method and apparatus for manufacturing semiconductor device
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US Patent 7892710 Method for making three-dimensional structures on a substrate having micron dimensions, and an article of manufacture three-dimensional objects on a substrate with micron dimensions
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US Patent 7892723 Method for forming patterned photoresist layer
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US Patent 7897323 Lithographic method
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US Patent 7901869 Double patterning with a double layer cap on carbonaceous hardmask
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US Patent 7906270 Reduced pitch multiple exposure process
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US Patent 7906275 Self-aligned spatial frequency doubling
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US Patent 7910289 Use of dual mask processing of different composition such as inorganic/organic to enable a single poly etch using a two-print-two-etch approach
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US Patent 7910291 Method for manufacturing semiconductor device using immersion lithography process
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US Patent 7914972 Exposure method and device manufacturing method
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US Patent 7914974 Anti-reflective imaging layer for multiple patterning process
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US Patent 7914975 Multiple exposure lithography method incorporating intermediate layer patterning
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US Patent 7919228 Method of forming pattern of semiconductor device
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US Patent 7923201 Near-field exposure method
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US Patent 7923202 Layer patterning using double exposure processes in a single photoresist layer
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US Patent 7932019 Gettering members, methods of forming the same, and methods of performing immersion lithography using the same
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US Patent 7935477 Double patterning strategy for contact hole and trench
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US Patent 7939246 Charged particle beam projection method
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US Patent 7943285 Pattern formation method
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US Patent 7943286 Reproducible, high yield method for fabricating ultra-short T-gates on HFETs
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US Patent 7947430 Method of forming 3D micro structures with high aspect ratios
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US Patent 7947432 Pattern formation method
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US Patent 7947433 Exposure method
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US Patent 7955787 Plasma display panel manufacturing method
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US Patent 7960096 Sublithographic patterning method incorporating a self-aligned single mask process
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US Patent 7960097 Methods of minimizing etch undercut and providing clean metal liftoff
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US Patent 7964336 Metal or metal compound pattern and forming method of pattern, and electron emitting device, electron source, and image-forming apparatus using the pattern
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US Patent 7965381 Self-aligned, sub-wavelength optical lithography
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US Patent 7968258 System and method for photolithography in semiconductor manufacturing
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US Patent 7968273 Methods and devices for forming nanostructure monolayers and devices including such monolayers
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US Patent 7968277 Imaging post structures using X and Y dipole optics and a single mask
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US Patent 7972765 Pattern forming method and a semiconductor device manufacturing method
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US Patent 7972766 Method for forming fine pattern of semiconductor device
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US Patent 7977032 Method to create region specific exposure in a layer
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US Patent 7977033 Method of forming pattern of semiconductor device
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US Patent 7977035 Method for forming fine pattern of semiconductor device
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US Patent 7977036 Resist pattern forming method
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US Patent 7981591 Semiconductor buried grating fabrication method
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US Patent 7981592 Double patterning method
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US Patent 7981595 Reduced pitch multiple exposure process
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US Patent 7985530 Etch-enhanced technique for lift-off patterning
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US Patent 7985534 Pattern forming method
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US Patent 7989143 Method of manufacturing a semiconductor device having an organic thin film transistor
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US Patent 7989145 Method for forming fine pattern of semiconductor device
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US Patent 7989146 Component fabrication using thermal resist materials
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US Patent 7989150 Manufacturing method of optical waveguide
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US Patent 7989154 Polymer or resist pattern, and metal film pattern, metal pattern and plastic mold using the same, and fabrication methods thereof
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US Patent 7993816 Method for fabricating self-aligned nanostructure using self-assembly block copolymers, and structures fabricated therefrom
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US Patent 7993817 Structure with self aligned resist layer on an insulating surface and method of making same
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US Patent 7998660 Exposure method
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US Patent 7998662 Structure for pattern formation, method for pattern formation, and application thereof
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US Patent 8003301 Manufacturing method for semiconductor device
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US Patent 8003305 Method for patterning a semiconductor wafer
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US Patent 8003306 Methods of forming electronic devices by ion implanting
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US Patent 8003308 Lithographic apparatus and device manufacturing method for writing a digital image
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US Patent 8003310 Masking techniques and templates for dense semiconductor fabrication
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US Patent 8003311 Integrated circuit system employing multiple exposure dummy patterning technology
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US Patent 8007990 Thick film layers and methods relating thereto
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US Patent 8012674 Efficient pitch multiplication process
Edits on 13 Dec, 2021
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US Patent 8012674 Efficient pitch multiplication process
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US Patent 8007990 Thick film layers and methods relating thereto
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edited on 8 Dec, 2021
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US Patent 8003310 Masking techniques and templates for dense semiconductor fabrication
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edited on 8 Dec, 2021
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US Patent 8003306 Methods of forming electronic devices by ion implanting
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Golden AI
edited on 8 Dec, 2021
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Patent primary examiner of
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US Patent 8003311 Integrated circuit system employing multiple exposure dummy patterning technology
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Golden AI
edited on 8 Dec, 2021
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Patent primary examiner of
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US Patent 8003308 Lithographic apparatus and device manufacturing method for writing a digital image
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edited on 8 Dec, 2021
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US Patent 8003305 Method for patterning a semiconductor wafer
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edited on 8 Dec, 2021
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US Patent 8003301 Manufacturing method for semiconductor device
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US Patent 7998660 Exposure method
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US Patent 7998662 Structure for pattern formation, method for pattern formation, and application thereof
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US Patent 7989146 Component fabrication using thermal resist materials
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edited on 8 Dec, 2021
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Golden AI
edited on 8 Dec, 2021
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Patent primary examiner of
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US Patent 7989150 Manufacturing method of optical waveguide
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edited on 8 Dec, 2021
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US Patent 7989145 Method for forming fine pattern of semiconductor device
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edited on 8 Dec, 2021
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US Patent 7989143 Method of manufacturing a semiconductor device having an organic thin film transistor
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edited on 8 Dec, 2021
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US Patent 7985534 Pattern forming method
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US Patent 7985530 Etch-enhanced technique for lift-off patterning

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